71. |
Visible laser action in N2‐laser‐pumped Ti vapor |
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Journal of Applied Physics,
Volume 68,
Issue 10,
1990,
Page 5378-5380
H. Ninomiya,
K. Hirata,
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摘要:
Ti vapor is produced in a He buffer gas. Ti metal is irradiated by a pulsed YAG laser, and its vapor is optically pumped by a N2laser at 337 nm. Laser lines at 551.4, 472.3, and 471.0 nm from the Ti3D01level which is connected to the ground state by the 337‐nm resonance line. Laser lines are reported for the first time at 551.5, 551.3, 431.5, and 547.4 nm from the3D02,3D03, or3G05levels which are not optically connected to the ground state by the 337 nm line. The laser transitions from the3D02,3D03, or3G05levels are observed only in a He‐Ti mixture.
ISSN:0021-8979
DOI:10.1063/1.347038
出版商:AIP
年代:1990
数据来源: AIP
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72. |
A novel test structure for grating pitch determination with near‐Angstrom accuracy |
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Journal of Applied Physics,
Volume 68,
Issue 10,
1990,
Page 5381-5382
M. C. Peckerar,
K. W. Rhee,
P.‐T. Ho,
J. Goldhar,
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摘要:
This communication describes a novel double‐grating test structure which enables grating pitch‐difference determination with angstrom accuracy. Edge acuity can also be estimated. The test structure is easily fabricated and rapidly evaluated with inexpensive equipment generally found in microstructure laboratories.
ISSN:0021-8979
DOI:10.1063/1.347039
出版商:AIP
年代:1990
数据来源: AIP
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73. |
Reactive ion etching of zinc doped InP using methane and hydrogen: Assessment of the degree and extent of changes in surface carrier concentration |
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Journal of Applied Physics,
Volume 68,
Issue 10,
1990,
Page 5383-5384
Jaspal Singh,
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摘要:
Reactive ion etching of zinc‐doped InP has been assessed in terms of the degree and extent of the passivation (reduction in carrier concentration). It is found that passivation of acceptors depends on the rf power as well as etching times used. Reduction in carrier concentration as large as three orders of magnitude can be achieved by the use of powers as low as 0.5 W/cm2for 10 min. The effect of this passivation on the characteristics of semiconductor lasers is reported.
ISSN:0021-8979
DOI:10.1063/1.347017
出版商:AIP
年代:1990
数据来源: AIP
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74. |
Background impurity dependence of redistributions of implanted gallium in silicon during annealing |
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Journal of Applied Physics,
Volume 68,
Issue 10,
1990,
Page 5385-5387
Katsuhiro Yokota,
Hiroshi Furuta,
Shinji Ishihara,
Itsuro Kimura,
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摘要:
About 85% of Ga implanted into As doped Si, about 80% of that into Sb doped Si, and about 78% of that into P doped Si were lost into atmosphere during annealing at 950 °C for 30 min. The number lost depended on impurities in native oxide films on the Si surfaces.
ISSN:0021-8979
DOI:10.1063/1.347018
出版商:AIP
年代:1990
数据来源: AIP
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75. |
Phototransmission study of strained‐layer InxGa1−xAs/GaAs single quantum well structures |
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Journal of Applied Physics,
Volume 68,
Issue 10,
1990,
Page 5388-5390
Shu Yuan,
Shumin Wang,
Shixiong Qian,
Yufen Li,
T. G. Andersson,
Z‐G. Chen,
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摘要:
We report the phototransmission measurement of strained‐layer InxGa1−xAs/GaAs single quantum well structures at room temperature. The spectra obtained show distinct features of excitons in the single quantum wells. Fitting of the phototransmission spectrum indicates that the excitonic transition energy modulation is the main mechanism. The phototransmission can be used as a supplement to photoreflectance due to its sensitivity and convenience.
ISSN:0021-8979
DOI:10.1063/1.347019
出版商:AIP
年代:1990
数据来源: AIP
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76. |
Erratum: ‘‘P‐polarized optical properties of aggregated Au films’’ [J. Appl. Phys.68, 1820 (1990)] |
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Journal of Applied Physics,
Volume 68,
Issue 10,
1990,
Page 5391-5391
Georges Bader,
P. V. Ashrit,
Fernand E. Girouard,
Vo‐Van Truong,
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ISSN:0021-8979
DOI:10.1063/1.347199
出版商:AIP
年代:1990
数据来源: AIP
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