71. |
On the displacement fields for double forces in an ellipsoid |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6165-6166
C. J. Howard,
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摘要:
Townsend has considered the problem of double‐force defects distributed uniformly throughout elastically isotropicspheresand has achieved separation of the image displacements from those displacements which would occur in an infinite medium. Here it is shown how a similar separation of the total displacement into the two contributions can be achieved for the case of elastically isotropicellipsoidscontaining double‐force defects. Townsend’s result is derived as a special case.
ISSN:0021-8979
DOI:10.1063/1.324541
出版商:AIP
年代:1978
数据来源: AIP
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72. |
Inverse bremsstrahlung energy absorption in laser‐irradiated plasmas |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6167-6168
A. D. Krumbein,
Y. Shima,
H. Yatom,
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摘要:
The absorption of laser light was calculated at a number of laser frequencies and intensities in order to determine the effect of using different strong‐field expressions for the inverse bremsstrahlung absorption. These results are compared to those from experiments on LiD targets, and it is shown that the strong‐field formulation of Shima and Yatom gives results which are closer to the experimental points than either the weak‐field expression or an approximation due to Goldman.
ISSN:0021-8979
DOI:10.1063/1.324542
出版商:AIP
年代:1978
数据来源: AIP
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73. |
On total reflection of electromagnetic waves from moving plasmas |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6169-6170
D. Kalluri,
R. K. Shrivastava,
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摘要:
It is shown how the frequency range for total reflection at the interface between free space and plasma is modified by their relative motion.
ISSN:0021-8979
DOI:10.1063/1.324543
出版商:AIP
年代:1978
数据来源: AIP
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74. |
Etch pits and dislocation in {1¯012} Czochralski sapphire wafers |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6171-6172
K. M. Kim,
S. H. McFarlane,
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摘要:
The reliability of fused KOH for revealing dislocations in the (1¯012) rhombohedral plane in Czochralski‐grown sapphire single crystals was investigated by using x‐ray‐transmission topography. It was found that the etch pits represent closely the dislocations in the (1¯012) sapphire, although a one‐to‐one correspondence was not established.
ISSN:0021-8979
DOI:10.1063/1.324544
出版商:AIP
年代:1978
数据来源: AIP
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75. |
Thick‐plate technique for measuring ejecta from shocked surfaces |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6173-6175
J. R. Asay,
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摘要:
An experimental technique is discussed for measuring the mass‐velocity distribution of material ejected from strongly shocked surfaces. The two major advantages of this technique are, first, that it is useful for measuring large amounts of surface ejecta and, second, that it allows a direct determination of the mass‐velocity distribution of ejecta, without the need for differentiating experimental data. The method has been applied to a measurement of surface ejecta from shock‐loaded porous tungsten.
ISSN:0021-8979
DOI:10.1063/1.324545
出版商:AIP
年代:1978
数据来源: AIP
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76. |
Some experimental aspects of dc reactive sputtering |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6176-6178
M. Hecq,
A. Hecq,
M. Liemans,
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摘要:
Reactive sputtering of targets of certain noble (Au, Pt) and oxidizable metals (Co, Sn) are studied by glow discharge mass spectrometry (GDMS) and by x‐ray diffraction. It is concluded that (1) oxidation of the target occurs for Sn and Co, (2) a plasma reaction occurs for every metal, especially Au, and (3) a chemical decomposition of AuO and an oxidation to higher states occurs on the substrate for Pt, Co, and Sn.
ISSN:0021-8979
DOI:10.1063/1.324546
出版商:AIP
年代:1978
数据来源: AIP
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77. |
Mobility anisotropy determination by the photoelectromagnetic effect: Application to HgI2 |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6179-6181
F. Adduci,
L. Baldassarre,
A. Minafra,
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摘要:
Combined measurements of the photoelectromagnetic effect and photoconductivity in three different geometries can be used to determine the anisotropy factors (&mgr;n∥/&mgr;n⊥, &mgr;p∥/&mgr;p∥) and the mobility ratios (&mgr;n∥/&mgr;p∥, &mgr;n⊥/&mgr;p⊥) in anisotropic semiconductors. In the present work this method has been applied to mercuric iodide; previous data on electron mobilities are confirmed, whereas the hole mobility is nearly isotropic.
ISSN:0021-8979
DOI:10.1063/1.324547
出版商:AIP
年代:1978
数据来源: AIP
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78. |
Minority‐carrier‐lifetime determination in Hg0.68Cd0.32Te |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6182-6184
M. Lanir,
A. H. B. Vanderwyck,
C. C. Wang,
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摘要:
Values for the electron minority‐carrier lifetime &tgr;nin Hg0.68Cd0.32Te photodiodes were independently determined by two indirect techniques. Measurements of the junction resistance under zero bias at 210 K yield &tgr;n=2.3×10−7sec, and diffusion length measurements give &tgr;n=2.9×10−7sec. These results are in agreement with our calculations for radiative lifetime inp‐type Hg0.68Cd0.32Te. Similar measurements on gold‐doped material indicate a lifetime shorter by almost three orders of magnitude, and it is suggested that this is due to recombination associated with Shockley‐Read centers.
ISSN:0021-8979
DOI:10.1063/1.324548
出版商:AIP
年代:1978
数据来源: AIP
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79. |
Effect of gold recombination centers on the states at the oxide/silicon interface |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6185-6186
L. Faraone,
A. G. Nassibian,
J. G. Simmons,
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摘要:
The effect of gold recombination centers on the trapping state at the silicon/silicon‐oxide interface has been studied. The technique involves applying a linear voltage ramp to the device and measuring the resultingI‐Vcharacteristic. It is found that at low temperatures (∼230 °K) the technique resolves pronounced structure in the interfacial trap distribution that is not apparent at room temperature. Pronounced peaks in the distribution are reported occurring atEV+0.4 andEV+0.6 eV.
ISSN:0021-8979
DOI:10.1063/1.324549
出版商:AIP
年代:1978
数据来源: AIP
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80. |
Photoluminescence of thermally treatedn‐type Si‐doped GaAs |
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Journal of Applied Physics,
Volume 49,
Issue 12,
1978,
Page 6187-6188
W. Y. Lum,
H. H. Wieder,
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摘要:
Photoluminescence measurements on Si‐doped GaAs single crystals heat treated in vacuum at 400≲T≲800 °C reveal emission peaks at 1.363, 1.409, and 1.487 eV, which correspond to three acceptor levels introduced through the activation of vacancies and the site transfer of Si atoms during the annealing process.
ISSN:0021-8979
DOI:10.1063/1.324550
出版商:AIP
年代:1978
数据来源: AIP
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