Journal of Applied Physics


ISSN: 0021-8979        年代:1981
当前卷期:Volume 52  issue 1     [ 查看所有卷期 ]

年代:1981
 
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71. Proximity‐effect correction with linear programming
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  434-437

Allen M. Carroll,  

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72. The kinetics of dissociation of Cryolite (Na3AIF6) induced by electron bombardment
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  438-442

A.G. Knapp,   J.R. Hughes,  

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73. Surface rippling induced in thin films by a scanning laser
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  443-448

Harvey E. Cline,  

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74. Laser induced transient excitation of conducting targets by thermionic emission
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  449-454

John G. Meadors,   Michael A. Poirier,  

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75. Subsurface particle growth kinetics in physical vapor deposition
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  455-462

David Robertson,   Arnold L. Pundsack,  

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76. Hydrides of ternary TiFexM1−x(M=Cr, Mn, Co, Ni) intermetallics
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  463-467

M.H. Mintz,   S. Vaknin,   S. Biderman,   Z. Hadari,  

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77. A study of the mechanisms of ion nitriding by the application of a magnetic field
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  468-471

Avner Brokman,   Floyd R. Tuler,  

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78. Influence of charge carrier scattering on the exact form of the Hall curve
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  472-475

H. J. Rijks,   L. J. Giling,   J. Bloem,  

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79. cw laser annealing of hydrogenated amorphous silicon obtained by rf sputtering
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  476-479

J.P. Thomas,   M. Fallavier,   K. Affolter,   W. Lu¨thy,   M. Dupuy,  

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80. Decomposition and product formation in CF4‐O2plasma etching silicon in the afterglow
  Journal of Applied Physics,   Volume  52,   Issue  1,   1981,   Page  480-485

C. I. M. Beenakker,   J. H. J. van Dommelen,   R. P. J. van de Poll,  

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