Journal of Applied Physics


ISSN: 0021-8979        年代:1990
当前卷期:Volume 68  issue 4     [ 查看所有卷期 ]

年代:1990
 
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71. The impact of the metallization technology on junction behavior
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1869-1877

M. L. Polignano,   N. Circelli,  

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72. Wavelength effects in the ultraviolet‐laser ablation of polycarbonate and poly(&agr;‐methylstyrene) examined by time‐of‐flight mass spectroscopy
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1878-1882

S. G. Hansen,  

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73. A thermionic energy converter with an electrolytically etched tungsten emitter
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1883-1889

G. H. M. Gubbels,   R. Metselaar,  

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74. Modeling of two‐junction, series‐connected tandem solar cells using top‐cell thickness as an adjustable parameter
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1890-1895

Sarah R. Kurtz,   P. Faine,   J. M. Olson,  

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75. Anomalous effects on the current‐voltage characteristics ofp‐channel metal‐oxide‐semiconductor transistors in the temperature range 4.2–50 K
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1896-1901

A. G. Nassiopoulos,   D. Tsamakis,   E. Rocofyllou,  

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76. Modeling the memory retention characteristics of silicon‐nitride‐oxide‐silicon nonvolatile transistors in a varying thermal environment
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1902-1909

P. J. McWhorter,   S. L. Miller,   T. A. Dellin,  

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77. A comparison by means of calorimetry of solid state interdiffusion reactions in Ni/Zr and Ni/Ti composites
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1910-1913

B. E. White,   M. E. Patt,   E. J. Cotts,  

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78. Subnanosecond far infrared photoconductivity from a GaAs/AlGaAs multiquantum well
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1913-1915

R. E. M. de Bekker,   J. M. Chamberlain,   L. M. Claessen,   P. Wyder,   M. B. Stanaway,   R. T. Grimes,   M. Henini,   O. H. Hughes,   G. Hill,  

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79. Room‐temperature continuous operation of GaAs/AlGaAs lasers grown on Si by organometallic vapor‐phase epitaxy
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1916-1918

H. K. Choi,   C. A. Wang,   John C. C. Fan,  

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80. Performance characteristics of In0.6Ga0.4As/In0.52Al0.48As modulation‐doped field‐effect transistor monolithically integrated with In0.53Ga0.47Asp‐i‐nphotodiodes
  Journal of Applied Physics,   Volume  68,   Issue  4,   1990,   Page  1918-1920

Y. Zebda,   P. K. Bhattacharya,   D. Pavlidis,   J. P. Harrang,  

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