81. |
Mass densities of amorphous Co‐rich FeCo‐SiB alloys |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 626-627
Osamu Kohmoto,
Kazuo Ohya,
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摘要:
The mass densityD, the atom number per unit volume &rgr;0and the packing fraction &eegr; were studied for amorphous (FeCo)100−y(SizB1−z)yalloys having zero magnetostriction in the range of 20≤y≤30 and 0≤z≤0.6. The variations ofDand &rgr;0withyandzare understood in terms of the atomic weight and the atomic radius of each atom. &eegr; is observed to increase with decreasing Si/(Si+B) ratio. This is attributed to the difference of the site occupation between B and Si atoms.
ISSN:0021-8979
DOI:10.1063/1.334752
出版商:AIP
年代:1985
数据来源: AIP
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82. |
Frequency‐scanned deep‐level transient spectroscopy |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 628-630
P. M. Henry,
J. M. Meese,
J. W. Farmer,
C. D. Lamp,
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摘要:
The output signal in a deep‐level transient spectroscopy experiment is a function of both the rate‐window settings and sample temperature. Usually, the rate window is held fixed and the temperature scanned to produce the deep‐level spectrum. We will demonstrate that a deep‐level spectrum can also be obtained by fixing the temperature and scanning the rate window.
ISSN:0021-8979
DOI:10.1063/1.334753
出版商:AIP
年代:1985
数据来源: AIP
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83. |
Electron beam decomposition of CdCl2 |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 631-633
Mino Green,
C. J. Aidinis,
O. A. Fakolujo,
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摘要:
Thee‐beam stimulated reaction, CdCl2(s)→Cd(s)+2 Cl(g), has been studied in cadmium chloride thin films between 303 and 483 K using 2‐keV electrons. The dose required to make 90‐nm‐deep holes at 483 K is 3×10−3C cm−2. Extrapolated dosing levels of ∼6×10−5C cm−2are expected. The use of CdCl2as a positive‐type electron resist in a new scheme is proposed. A working model, useful for considering thee‐beam stimulated decomposition energetics and mechanism, is briefly discussed.
ISSN:0021-8979
DOI:10.1063/1.334754
出版商:AIP
年代:1985
数据来源: AIP
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84. |
1/fnoise and the field effect in gated resistors |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 634-636
G. A. Garfunkel,
M. B. Weissman,
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摘要:
A quantitative connection is made between the time‐dependent field effect and 1/fnoise in semiconductor devices exhibiting surface state occupancy fluctuations. Noise and ac field effect measurements were made on a gated silicon‐on‐sapphire resistor, providing direct evidence of a surface state contribution of ∼10% of the net 1/fnoise.
ISSN:0021-8979
DOI:10.1063/1.334755
出版商:AIP
年代:1985
数据来源: AIP
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85. |
Photoenhanced thermal oxidation of InP |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 637-642
M. Fathipour,
P. K. Boyer,
G. J. Collins,
C. W. Wilmsen,
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摘要:
The growth rate of laser‐photoenhanced thermally grown native oxides of InP in a N2O ambient and its dependence on growth condition are presented. Increased laser power, substrate temperature, and N2O pressure are observed to increase the growth rate. The topography and the composition of these oxides have been studied, using secondary electron microscopy and x‐ray photoemission spectroscopy, respectively. The oxide layers contain In2O3and a phosphate, probably InPO4. The enhanced growth appears to be caused by both excited oxidizing species and a photon‐enhanced surface reaction.
ISSN:0021-8979
DOI:10.1063/1.334756
出版商:AIP
年代:1985
数据来源: AIP
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86. |
Gauging film thickness: A comparison of an x‐ray diffraction technique with Rutherford backscattering spectrometry |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 643-645
Betty Coulman,
Haydn Chen,
L. E. Rehn,
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摘要:
An x‐ray diffraction technique for determining thin‐film thickness is presented which should prove to be a valuable alternative to the array of spectroscopies (Rutherford backscattering spectrometry, Auger electron spectroscopy, etc.) currently favored for these measurements. Some of the virtues of this x‐ray diffraction approach are its nondestructive nature, fast data acquisition rate (enablinginsituobservations), thickness resolution better than 5 nm, and conventional equipment requirements. Results are shown for Pd2Si thin films grown during isothermal annealing of Pd coatings (100 nm) on Si at 200 °C for various amounts of time. A comparison of these x‐ray measurements with Rutherford backscattering spectrometry data taken from the same specimens is used to demonstrate the validity of the x‐ray technique.
ISSN:0021-8979
DOI:10.1063/1.334757
出版商:AIP
年代:1985
数据来源: AIP
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87. |
Current‐voltage characteristics of ideal silicon diodes in the range 300–400 K |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 646-647
P. Cappelletti,
G. F. Cerofolini,
M. L. Polignano,
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摘要:
Current‐voltage characteristics of silicon diodes which were found to be ideal at room temperature have been investigated in the range 300–400 K. The diodes remain ideal at higher temperatures, too.
ISSN:0021-8979
DOI:10.1063/1.334758
出版商:AIP
年代:1985
数据来源: AIP
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88. |
Use of high‐field data for determining the Curie temperature |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 648-649
Amikam Aharoni,
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摘要:
A modified equation of state is proposed, which allows the use of the Arrott plots at high magnetic fields. The equation is shown to fit rather well the experimental data of Potter on crystalline Fe, and those of Kaul and Rosenberg on amorphous Fe13Ni67B19Si alloy.
ISSN:0021-8979
DOI:10.1063/1.334759
出版商:AIP
年代:1985
数据来源: AIP
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89. |
Erratum: Distribution of interatomic spacings in random alloys [J. Appl. Phys.52, 7165 (1981)] |
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Journal of Applied Physics,
Volume 57,
Issue 2,
1985,
Page 650-650
Sverre Froyen,
Conyers Herring,
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ISSN:0021-8979
DOI:10.1063/1.335511
出版商:AIP
年代:1985
数据来源: AIP
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