Journal of Applied Physics


ISSN: 0021-8979        年代:1980
当前卷期:Volume 51  issue 5     [ 查看所有卷期 ]

年代:1980
 
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81. Energy transfer processes in YVO4:Nd3+
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2829-2835

Dhiraj Sardar,   Richard C. Powell,  

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82. Saturation characteristics ofp‐type semiconductors over the CO2laser spectrum
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2836-2839

R. B. James,   D. L. Smith,  

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83. Compensation mechanisms in GaAs
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2840-2852

G. M. Martin,   J. P. Farges,   G. Jacob,   J. P. Hallais,   G. Poiblaud,  

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84. Monte Carlo calculation approach to quantitative Auger electron spectroscopy
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2853-2860

Shingo Ichimura,   Mikio Aratama,   Ryuichi Shimizu,  

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85. An analytical formula and important parameters for low‐energy ion sputtering
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2861-2865

J. Bohdansky,   J. Roth,   H. L. Bay,  

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86. The effect of carrier diffusion on laser heating of lightly damaged semiconductors
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2866-2878

Jaroslava Z. Wilcox,  

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87. Quantum efficiency of InP field‐assisted photocathodes
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2879-2883

T. J. Maloney,   M. G. Burt,   J. S. Escher,   P. E. Gregory,   S. B. Hyder,   G. A. Antypas,  

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88. Angular distribution of Si atoms sputtered by keV Ar+ions
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2884-2887

T. Okutani,   M. Shikata,   S. Ichimura,   R. Shimizu,  

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89. Auger spectra induced by 100‐keV Ar+impact on Be, Al, and Si
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2888-2893

W. A. Metz,   K. O. Legg,   E. W. Thomas,  

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90. Experimental study of impregnated‐cathode behavior, emission, and life
  Journal of Applied Physics,   Volume  51,   Issue  5,   1980,   Page  2894-2902

P. Palluel,   A. M. Shroff,  

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