81. |
Transient response ofn‐channel metal‐oxide‐semiconductor field‐effect transistors during turnon at 10–25 °K |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3865-3872
S. K. Tewksbury,
Preview
|
PDF (560KB)
|
|
摘要:
The transient, excess source‐drain current which occurs under freeze‐out conditions when a metal‐oxide‐semiconductor field‐effect transistor (MOSFET) is switched into a conducting state is described. The major features of the observed transient response forn‐channel MOSFET’s in the temperature range 10–25 °K are explained in terms of a simple one‐dimensional model. The transient response is largely independent of both temperature (in this range) and the static current level, except for the variation of relaxation rate with temperature. The transient response waveform and the temperature dependence of the relaxation rate forn‐channel MOSFET’s differ greatly from previously reported results onp‐channel MOSFET’s.
ISSN:0021-8979
DOI:10.1063/1.331131
出版商:AIP
年代:1982
数据来源: AIP
|
82. |
High speed response of a GaAs metal‐semiconductor field‐effect transistor to electron‐beam excitation |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3873-3877
L. D. Flesner,
N. M. Davis,
H. H. Wieder,
Preview
|
PDF (308KB)
|
|
摘要:
Subnanosecond current gain response of a GaAs power metal‐semiconductor field‐effect transistor to electron‐beam pulses is described. Two distinct gain mechanisms are deduced from the data.
ISSN:0021-8979
DOI:10.1063/1.331087
出版商:AIP
年代:1982
数据来源: AIP
|
83. |
Photocapacitance study of deep levels due to nonstoichiometry in nitrogen‐free GaP light‐emitting diodes |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3878-3883
J. Nishizawa,
Y. J. Shi,
K. Suto,
M. Koike,
Preview
|
PDF (396KB)
|
|
摘要:
Photocapacitance spectra of the excitation probability of electrons (or holes) occupied in deep levels have been measured for S‐ and Te‐doped nitrogen‐free GaP light‐emitting diodes grown by temperature difference method of liquid phase epitaxy under various phosphorus pressures in the vicinity of the optimum pressure (Popt). A band at 2.00 eV observed for the diodes grown under phosphorus pressures higher thanPoptis attributed to interstitial phosphorus atoms. On the other hand, bands at 2.10 and 2.20 eV which were observed, respectively, in the spectra of S‐ and Te‐doped diodes grown under phosphorus pressure lower thanPoptare attributed to complex centers of phosphorus vacancies and donors.
ISSN:0021-8979
DOI:10.1063/1.331088
出版商:AIP
年代:1982
数据来源: AIP
|
84. |
High gradient magnetic capture of red blood cells |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3884-3887
Charles S. Owen,
Preview
|
PDF (328KB)
|
|
摘要:
High gradient magnetic retention of paramagnetic red blood cells was measured under conditions which gave rise to only partial capture of the cells in each sample. The dependence on buffer flow rate, magnetic field, and particle paramagnetic susceptibility was determined and compared with theoretical models. In addition, parallel and transverse geometries (field parallel to, or perpendicular to, flow) were compared and no difference was observed in the probability of capture of weakly paramagnetic cells in a lightly loaded filter bed.
ISSN:0021-8979
DOI:10.1063/1.331089
出版商:AIP
年代:1982
数据来源: AIP
|
85. |
Multitube collimators driven at high pressure for molecular spectroscopy |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3888-3889
G. Baldacchini,
S. Marchetti,
V. Montelatici,
Preview
|
PDF (147KB)
|
|
摘要:
Multitube collimators driven at low pressure, usually 1 Torr or less, have been extensively used up to now to produce collimated molecular beams. We have found experimentally that such devices, when driven at high pressure, 1<P0<100 Torr, lose almost completely their collimation properties. However, they produce a sensible cooling of the gas in the beam at a density high enough to make the high‐pressure regime attractive for molecular spectroscopy. Moreover, we have observed for the first time an oscillatory behavior of the angular spread of the beam versus the pressure.
ISSN:0021-8979
DOI:10.1063/1.331090
出版商:AIP
年代:1982
数据来源: AIP
|
86. |
Ray optics of guided TM waves in a slab of uniaxially anisotropic plasma |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3890-3891
K. Yasumoto,
Preview
|
PDF (131KB)
|
|
摘要:
A ray optical description is presented for the TM wave guided by a slab of uniaxially anisotropic plasma. An interesting feature of the totally reflected ray within the slab is brought out.
ISSN:0021-8979
DOI:10.1063/1.331091
出版商:AIP
年代:1982
数据来源: AIP
|
87. |
Mg+implantation into AlxGa1−xAs |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3892-3893
Shigeo Ashigaki,
Yunosuke Makita,
Toshihiko Kanayama,
Toshio Tsurushima,
Preview
|
PDF (157KB)
|
|
摘要:
Ion implantation of Mg into AlxGa1−xAs was carried out at room temperature. After annealing at 700 °C, GaAs showed nearly 100% electrical activation, however, Al0.60Ga0.40As showed only 15% electrical activation. We explain this result in terms of increasing acceptor energy level and outdiffusion of Mg with increasing alloy compositionx.
ISSN:0021-8979
DOI:10.1063/1.331092
出版商:AIP
年代:1982
数据来源: AIP
|
88. |
Infrared absorption and defects in Al‐doped ZnSe |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3894-3896
J. S. Ko,
W. G. Spitzer,
Preview
|
PDF (217KB)
|
|
摘要:
It is suggested that the infrared absorption spectrum of the localized vibrational modes of Al‐doped ZnSe can be explained by two Al defects: AlZnand an Al dimer, possibly 2AlAn‐VZn, where the 2AlZnand theVZnare all second‐nearest neighbors.
ISSN:0021-8979
DOI:10.1063/1.331093
出版商:AIP
年代:1982
数据来源: AIP
|
89. |
Polysilicon transistors on glass by pulsed‐laser annealing |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3897-3899
F. Morin,
P. Coissard,
M. Morel,
E. Ligeon,
A. Bontemps,
Preview
|
PDF (215KB)
|
|
摘要:
Amorphous silicon thin films deposited on glass substrates were crystallized by pulsed‐laser annealing. A grain size up to 2000 A˚ was observed. Transistors were made, and electrical measurements showed that the field‐effect mobility was in the range 15–20 cm2/V s, instead of 10−2−10−3cm2/V s in the unannealed regions.
ISSN:0021-8979
DOI:10.1063/1.331094
出版商:AIP
年代:1982
数据来源: AIP
|
90. |
Utilization of Rutherford backscatter spectroscopy for the determination of thin‐film densities |
|
Journal of Applied Physics,
Volume 53,
Issue 5,
1982,
Page 3900-3902
D. G. Simons,
C. R. Crowe,
M. D. Brown,
Preview
|
PDF (167KB)
|
|
摘要:
A method to determine densities of thin surface films by measuring areal densities using Rutherford backscatter spectroscopy coupled with linear film‐thickness measurements is described. This technique can be nondestructive and has an accuracy of 10 to 15%. Sample measurements on various thin films are given to demonstrate the use of this procedure.
ISSN:0021-8979
DOI:10.1063/1.331095
出版商:AIP
年代:1982
数据来源: AIP
|