Journal of Applied Physics


ISSN: 0021-8979        年代:1992
当前卷期:Volume 71  issue 10     [ 查看所有卷期 ]

年代:1992
 
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81. Self‐consistent dc glow‐discharge simulations applied to diamond film deposition reactors
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5189-5198

M. Surendra,   D. B. Graves,   L. S. Plano,  

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82. Oxidation kinetics of thin and ultrathin cobalt films
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5199-5204

L. Smardz,   U. Ko¨bler,   W. Zinn,  

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83. Role of hydrogen dilution and diborane doping on the growth mechanism ofp‐type microcrystalline silicon films prepared by photochemical vapor deposition
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5205-5211

Sukriti Ghosh,   Abhijit De,   Swati Ray,   A. K. Barua,  

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84. Study on polished and etched surfaces of polar (111) CdTe by x‐ray photoelectron spectroscopy and grazing‐incidence x‐ray diffraction
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5212-5216

T. B. Wu,   J. S. Chen,   C. D. Chiang,   Y. M. Pang,   S. J. Yang,  

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85. Investigation of Ni–P–B ultrafine amorphous alloy particles produced by chemical reduction
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5217-5221

Jianyi Shen,   Zheng Hu,   Qinghong Zhang,   Lifeng Zhang,   Yi Chen,  

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86. Salt‐finger instability in an anisotropic and inhomogeneous porous substrate underlying a fluid layer
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5222-5236

Falin Chen,  

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87. Shading losses of solar‐cell metal grids
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5237-5241

A. W. Blakers,  

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88. Effect of electronic strain on the optically induced mechanical moment in silicon microstructures
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5242-5245

Albert Prak,   Theo S. J. Lammerink,  

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89. Limitations on models describing the kinetics of light‐induced defect creation in hydrogenated amorphous silicon
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5246-5247

Richard H. Bube,   David Redfield,  

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90. Spin cast thin films of fullerenes and fluorinated fullerenes: Preparation and characterization by x‐ray reflectivity and surface diffuse x‐ray scattering
  Journal of Applied Physics,   Volume  71,   Issue  10,   1992,   Page  5248-5250

I. Belaish,   I. Entin,   R. Goffer,   D. Davidov,   H. Selig,   J. P. McCauley,   N. Coustel,   J. E. Fischer,   A. B. Smith,  

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