Journal of Applied Physics


ISSN: 0021-8979        年代:1982
当前卷期:Volume 53  issue 6     [ 查看所有卷期 ]

年代:1982
 
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81. The relationship among electromigration, passivation thickness, and common‐emitter current gain degradation within shallow junction NPN bipolar transistors
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4456-4462

R. S. Hemmert,   G. S. Prokop,   J. R. Lloyd,   P. M. Smith,   G. M. Calabrese,  

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82. Optical properties of a new bistable twisted nematic liquid crystal boundary layer display
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4463-4479

R. N. Thurston,   Julian Cheng,   G. D. Boyd,  

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83. Thermal annealing of implantation strain in bubble garnet films: Stability of ion‐implanted propagation devices
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4480-4484

R. D. Pierce,   R. Caruso,   C. J. Mogab,  

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84. Signal and noise in magneto‐optical readout
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4485-4494

Masud Mansuripur,   G. A. N. Connell,   Joseph W. Goodman,  

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85. The geometry and permittivity of snow at high frequencies
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4495-4500

S. C. Colbeck,  

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86. Method for locating and characterizing neutron sources
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4501-4502

Robert L. Fleischer,   Herwig G. Paretzke,  

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87. On the upper state formation kinetics and line tunability of the iodine monofluoride discharge laser
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4503-4505

M. L. Dlabal,   J. G. Eden,  

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88. Microwave method for determining the electron density in a high‐density plasma
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4506-4508

S. Ghorai,   J. Basu,   S. K. Das,  

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89. Hydrogen passivation of a bulk donor defect (Ec−0.36 eV) in GaAs
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4509-4511

S. J. Pearton,  

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90. Shock temperatures in fused silica measured by optical technique
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4512-4514

H. Sugiura,   K. Kondo,   A. Sawaoka,  

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