Journal of Applied Physics


ISSN: 0021-8979        年代:1982
当前卷期:Volume 53  issue 4     [ 查看所有卷期 ]

年代:1982
 
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81. Evaluation of amines as bases for the H2O2‐Cl2singlet‐oxygen generation reaction
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3272-3277

R. J. Richardson,   P. A. G. Carr,   F. E. Hovis,   H. Y. Ageno,   J. K. Hurst,  

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82. Reduction of solar cell efficiency by bulk defects across the back‐surface‐field junction
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3278-3290

C. T. Sah,   K. A. Yamakawa,   R. Lutwack,  

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83. On the effect of parasitic parameters on efficiency in energy compression networks
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3291-3296

Oved Zucker,  

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84. Apparatus for adapting a high‐pressure light scattering cell to density measurement
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3297-3298

M. Abebe,   P. E. Schoen,  

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85. Scanning x‐ray radiography: First tests in an electron spectrometer
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3299-3302

J. Cazaux,   D. Mouze,   J. Perrin,  

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86. Unstable oscillatory Pierce modes of neutralized electron beams
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3303-3304

John R. Cary,   Don S. Lemons,  

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87. Derivation of the current‐potential equation for steady point‐to‐plane corona discharges
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3305-3307

Bob L. Henson,  

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88. Temperature and field dependence of intergrain barriers in polycrystallinen‐InSb films
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3308-3310

A. L. Dawar,   A. D. Sen,   H. K. Dewan,   O.P. Taneja,   P. C. Mathur,  

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89. Deep levels in Si‐implanted and thermally annealed semi‐insulating GaAs:Cr
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3311-3313

Jin K. Rhee,   Pallab K. Bhattacharya,   Richard Y. Koyama,  

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90. Diffusion of aluminum in ion‐implanted alpha iron
  Journal of Applied Physics,   Volume  53,   Issue  4,   1982,   Page  3314-3316

J. Hirvonen,   J. Ra¨isa¨nen,  

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