Journal of Applied Physics


ISSN: 0021-8979        年代:1982
当前卷期:Volume 53  issue 5     [ 查看所有卷期 ]

年代:1982
 
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91. Effect of electric fields on growth of copper whiskers by chemical reduction
  Journal of Applied Physics,   Volume  53,   Issue  5,   1982,   Page  3903-3905

Herman H. Hobbs,  

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92. Thermal study of the Pt‐Al reaction and its effects on contact resistance to silicon
  Journal of Applied Physics,   Volume  53,   Issue  5,   1982,   Page  3906-3908

S. S. Cohen,  

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93. Interaction betweenn‐type amorphous hydrogenated silicon films and metal electrodes
  Journal of Applied Physics,   Volume  53,   Issue  5,   1982,   Page  3909-3911

S. Ishihara,   T. Hirao,   K. Mori,   M. Kitagawa,   M. Ohno,   S. Kohiki,  

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94. A simple approximate model for potential distributions of a semiconductor sample having a surface inversion region
  Journal of Applied Physics,   Volume  53,   Issue  5,   1982,   Page  3912-3917

Ying‐Chao Ruan,  

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95. On recent studies about sources of acoustic emission in technical superconductors
  Journal of Applied Physics,   Volume  53,   Issue  5,   1982,   Page  3918-3920

G. Pasztor,   C. Schmidt,  

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96. Gallium arsenide laser diode emission spectra in pulsed magnetic fields of up to 26 T
  Journal of Applied Physics,   Volume  53,   Issue  5,   1982,   Page  3921-3922

Jeffrey A. Davis,  

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97. CO laser annealing of arsenic‐implanted silicon
  Journal of Applied Physics,   Volume  53,   Issue  5,   1982,   Page  3923-3925

M. Delfino,  

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98. An effect of back‐surface boron implantation on silicon solar cells
  Journal of Applied Physics,   Volume  53,   Issue  5,   1982,   Page  3926-3926

Mark B. Spitzer,   Stanley J. Solomon,   Peter R. Younger,  

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