Journal of Applied Physics


ISSN: 0021-8979        年代:1995
当前卷期:Volume 77  issue 7     [ 查看所有卷期 ]

年代:1995
 
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91. Electrical properties of Schottky contacts toN‐type ZnS0.07Se0.93epilayers
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3513-3517

A. Z. Wang,   W. A. Anderson,   M. A. Haase,  

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92. Characteristics of an optically activated pulsed power GaAs(Si:Cu) switch obtained by two‐dimensional modeling
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3518-3522

Phillip J. Stout,   Mark J. Kushner,  

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93. Field‐effect transistors based on poly(p‐phenylene vinylene) doped by ion implantation
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3523-3527

K. Pichler,   C. P. Jarrett,   R. H. Friend,   B. Ratier,   A. Moliton,  

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94. Magnetic measurements: A powerful tool in magnetic refrigerator design
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3528-3537

M. Fo¨ldea`ki,   R. Chahine,   T. K. Bose,  

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95. Experimental evidence for statistical‐inhomogeneous distributed dopant atoms in a Si metal‐oxide‐semiconductor field‐effect transistor
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3538-3540

Tomohisa Mizuno,   Akira Toriumi,  

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96. Simple analysis of transient photoconductivity for determination of localized‐state distributions in amorphous semiconductors using Laplace transform
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3541-3542

Hiroyoshi Naito,   Masahiro Okuda,  

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97. Temperature dependence of ion‐beam mixing in III–V semiconductors
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3543-3545

D. V. Forbes,   J. J. Coleman,   J. L. Klatt,   R. S. Averback,  

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98. Formation and optical characterization of nanometer dimension colloids in silica formed by sequentially implanting In and Ag
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3546-3548

R. H. Magruder,   R. A. Zuhr,  

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99. Kinetic of the growth of chemically etched porous silicon
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3549-3551

G. Di Francia,   A. Citarella,  

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100. Compositional dependence of AlAsySb1−yternaries on the ratio of Sb/As fluxes and on the substrate temperature
  Journal of Applied Physics,   Volume  77,   Issue  7,   1995,   Page  3552-3553

S. Ne´meth,   B. Grietens,   G. Borghs,  

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