Journal of Applied Physics


ISSN: 0021-8979        年代:1986
当前卷期:Volume 59  issue 4     [ 查看所有卷期 ]

年代:1986
 
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1. Cathodoluminescence scanning electron microscopy of semiconductors
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1-24

B. G. Yacobi,   D. B. Holt,  

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2. Measurement of the silver freezing point with an optical fiber thermometer: Proof of concept
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1005-1012

R. R. Dils,   J. Geist,   M. L. Reilly,  

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3. X‐ray diagnostic for current density profiling relativistic electron beams in vacuum and gas
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1013-1021

Dennis Slaughter,   Louis Koppel,   Jerel Smith,  

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4. Effect of nonuniform work function on space‐charge‐limited current
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1022-1027

E. A. Adler,   R. T. Longo,  

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5. Uniformity of an embedded stripe large optical‐cavity GaAs/GaAlAs double‐heterostructure laser grown by metallo‐organic chemical vapor deposition
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1028-1030

D. Fekete,  

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6. Correlation between degradation and device characteristic changes in InGaAsP/InP buried heterostructure lasers
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1031-1037

Mitsuo Fukuda,   Genzo Iwane,  

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7. Reduction of relaxation resonance and wavelength chirp in antireflection facet coated 1.3‐&mgr;m Vee‐groove InGaAsP lasers
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1038-1041

J. P. van der Ziel,   R. M. Mikulyak,   H. M. Blount,  

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8. Transport coefficients of a chemically reacting plasma
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1042-1047

M. L. Mittal,   G. Paran Gowda,  

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9. Analytic relationships for characterizing electrical properties and electron density profiles in gas discharge columns
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1048-1051

Gerald L. Rogoff,   Keith Kussmaul,  

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10. Time‐dependent excitation in high‐ and low‐frequency chlorine plasmas
  Journal of Applied Physics,   Volume  59,   Issue  4,   1986,   Page  1052-1062

Daniel L. Flamm,   Vincent M. Donnelly,  

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