Journal of Applied Physics


ISSN: 0021-8979        年代:1995
当前卷期:Volume 77  issue 3     [ 查看所有卷期 ]

年代:1995
 
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1. Simulation of diffusion and trapping in digitized heterogeneous media
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  955-964

David A. Coker,   Salvatore Torquato,  

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2. Relaxation processes in poled nonlinear optical polymer films
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  965-969

Akiyoshi Suzuki,   Yoshihiko Matsuoka,  

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3. Static electric fields due to seeding inside and outside of a planar waveguide
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  970-975

M. L. Brauer,   I. Dajani,  

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4. Optical and magnetic resonance study of impurity ions in undoped and cerium‐doped Sr0.61Ba0.39Nb2O6
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  976-980

N. C. Giles,   J. L. Wolford,   G. J. Edwards,   R. Uhrin,  

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5. Intensity dependence of the third‐harmonic‐generation efficiency for high‐power far‐infrared radiation inn‐silicon
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  981-984

M. Urban,   Ch. Nieswand,   M. R. Siegrist,   F. Keilmann,  

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6. Study of surface charges on dielectric electrodes in a radio‐frequency glow discharge
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  985-991

S. Kakuta,   T. Kamata,   T. Makabe,   S. Kobayashi,   K. Terai,   T. Tamagawa,  

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7. Unified particle simulation technique for the plasma bulk and the cathode sheath of a dc glow discharge
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  992-1000

Peter Meyer,   Gu¨nter Wunner,   Wolfgang Schmitt,   Hanns Ruder,  

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8. X‐ray scattering from nonideal multilayer structures: Calculations in the kinematical approximation
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  1001-1009

A. Bruson,   J. C. Toussaint,  

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9. Formation and kinetics of ion‐induced yttrium silicide layers
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  1010-1014

T. L. Alford,  

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10. Distribution of incident ions and retained dose analysis for a wedge‐shaped target in plasma source ion implantation
  Journal of Applied Physics,   Volume  77,   Issue  3,   1995,   Page  1015-1019

Shamim M. Malik,   D. E. Muller,   K. Sridharan,   R. P. Fetherston,   Ngoc Tran,   J. R. Conrad,  

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