Journal of Applied Physics


ISSN: 0021-8979        年代:1995
当前卷期:Volume 78  issue 7     [ 查看所有卷期 ]

年代:1995
 
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1. Maximum power and thermal efficiency of an irreversible power cycle
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4313-4318

Mohand A. Ait‐Ali,  

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2. Resonant cavity excitation system for radial array slab CO2lasers
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4319-4322

W. D. Bilida,   H. J. J. Seguin,   C. E. Capjack,  

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3. Intensity‐dependent absorption and photorefractive properties in cerium‐doped BaTiO3crystals
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4323-4330

Changxi Yang,   Yuheng Zhang,   Xianmin Yi,   Pochi Yeh,   Yong Zhu,   Mengjun Hui,   Xing Wu,  

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4. Three variable modeling of switching in ferroelectric liquid crystals
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4331-4338

S. J. Elston,   D. C. Ulrich,  

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5. Imaging of the optical mode of waveguiding devices by scanning near‐field optical microscopy
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4339-4344

R. Cella,   B. Mersali,   A. Bruno,   S. Davy,   H. Bru¨ckner,   C. Licoppe,  

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6. Diffraction efficiency analysis in hologram gratings recorded by counterpropagating‐type geometry
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4345-4352

Koutarou Nonaka,  

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7. Effective medium treatment of laminar flow in magnetic filtration
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4353-4359

Mayuree Natenapit,  

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8. A simplified hydrokinetic model for a steady‐state microwave discharge sustained by traveling waves at atmospheric pressure conditions
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4360-4370

F. J. Gordillo‐Va´zquez,   J. Cotrino,  

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9. Two‐dimensional particle simulation of plasma expansion between plane parallel electrodes
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4371-4381

Kartik Patel,   V. K. Mago,  

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10. Sequential phase formation by ion‐induced epitaxy in Fe‐implanted Si(001)
  Journal of Applied Physics,   Volume  78,   Issue  7,   1995,   Page  4382-4385

X. W. Lin,   R. Maltez,   M. Behar,   Z. Liliental‐Weber,   J. Washburn,  

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