Journal of Applied Physics


ISSN: 0021-8979        年代:1961
当前卷期:Volume 32  issue 4     [ 查看所有卷期 ]

年代:1961
 
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1. Diffusion in a Liquid Indium‐Tin Alloy at Several Concentrations
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  559-561

A. Paoletti,   M. Vincentini‐Missoni,  

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2. Effects of Doping Additions on the Thermoelectric Properties of the Intrinsic Semiconductor Bi2Te2.1Se0.9
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  562-564

L. C. Bennett,   J. R. Wiese,  

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3. Measurement of Noise Power Spectra by Fourier Analysis
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  565-568

A. Ziya Akcasu,  

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4. Determination of the Semiconductor Surface Potential under a Metal Contact
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  568-570

N. J. Harrick,  

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5. Man‐Made Heating and Ionization of the Upper Atmosphere
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  570-577

P. A. Clavier,  

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6. Propagation in a Plasma
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  578-582

P. A. Clavier,  

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7. Measurement of the Electrical Conductivity and Dielectric Constant without Contacting Electrodes
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  583-592

Tomoya Ogawa,  

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8. Cross Slip and Cross Climb of Dislocations Induced by a Locked Dislocation
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  593-599

James C. M. Li,  

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9. Surface Electrical Changes Caused by the Adsorption of Hydrogen and Oxygen on Silicon
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  600-609

J. T. Law,  

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10. Response of a Thermocouple Circuit to Nonsteady Currents
  Journal of Applied Physics,   Volume  32,   Issue  4,   1961,   Page  609-616

Thomas T. Arai,   John R. Madigan,  

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