Journal of Applied Physics


ISSN: 0021-8979        年代:1995
当前卷期:Volume 78  issue 3     [ 查看所有卷期 ]

年代:1995
 
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1. Thermodynamic analysis of spherulitic growth in semicrystalline poly(ethylene oxide)
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1401-1405

G. Di Marco,   M. Lanza,   M. Pieruccini,  

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2. Fast positronium formation and dissociation at surfaces
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1406-1410

D. W. Gidley,   D. N. McKinsey,   P. W. Zitzewitz,  

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3. Comparison of stepped‐well and square‐well multiple‐quantum‐well optical modulators
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1411-1414

T. K. Woodward,   J. E. Cunningham,   W. Y. Jan,  

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4. Theoretical investigation of fabrication‐related disorder on the properties of photonic crystals
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1415-1418

Shanhui Fan,   Pierre R. Villeneuve,   J. D. Joannopoulos,  

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5. Estimation of strain arising from the assembling process and influence of assembling materials on performance of laser diodes
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1419-1423

Kimio Shigihara,   Yutaka Nagai,   Shoichi Karakida,   Masao Aiga,   Mutsuyuki Otsubo,   Kenji Ikeda,  

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6. Analysis of heat transfer to a spherical particle from continuum plasma
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1424-1429

M. A. Jog,  

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7. Thermodynamics of latent heat storage in parallel or in series with a heat engine
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1430-1437

Chaim Charach,   Massimo Conti,  

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8. Insitumeasurements of changes in the structure and in the excess charge‐carrier kinetics at the silicon surface during hydrogen and helium plasma exposure
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1438-1445

H. C. Neitzert,   N. Layadi,   P. Roca i Cabarrocas,   R. Vanderhaghen,   M. Kunst,  

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9. Analytic model of power deposition in inductively coupled plasma sources
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1446-1458

V. Vahedi,   M. A. Lieberman,   G. DiPeso,   T. D. Rognlien,   D. Hewett,  

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10. Effects of gas flame annealing on the structure ofpoly‐Si films
  Journal of Applied Physics,   Volume  78,   Issue  3,   1995,   Page  1459-1464

Y. Masaki,   M. Suzumi,   W. F. Qu,   Y. Kakimoto,   A. Kitagawa,   M. Suzuki,  

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