Journal of Vacuum Science and Technology


ISSN: 0022-5355        年代:1973
当前卷期:Volume 10  issue 3     [ 查看所有卷期 ]

年代:1973
 
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1. Miniaturizing the Cold Cathode Vacuum Gauge
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  3,   1973,   Page  433-435

Robert O. Woods,  

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2. Control of Resistivity, Microstructure, and Stress in Electron Beam Evaporated Tungsten Films
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  3,   1973,   Page  436-444

A. K. Sinha,   T. E. Smith,   T. T. Sheng,   N. N. Axelrod,  

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3. Preparation of Thin-Film Diffusion Microcouples in Ternary Alloys
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  3,   1973,   Page  445-449

M. Murakami,   D. de Fontaine,   P. Shipley,   W. Rodgers,  

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4. A New Technique for High Speed Anodization in a dc Oxygen Glow Discharge
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  3,   1973,   Page  450-452

J. F. O’Hanlon,   M. Sampogna,  

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5. Investigation of the Effects of Heating inCO2on the Oxide-Coated Cathode Surface Microtopography and Emission Characteristics of a Triode Electron Tube
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  3,   1973,   Page  453-463

E. J. Nowak,   A. J. Max,   J. K. Maurin,  

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6. Mass Spectrometric Analysis of the Sputter Gas Atmosphere without Pressure Reduction System
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  3,   1973,   Page  464-471

J. Visser,  

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7. The Separation Efficiency of the Molecular Distillation
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  3,   1973,   Page  472-477

Jer Ru Maa,   Sun Yuan Tsay,  

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