Journal of Vacuum Science and Technology


ISSN: 0022-5355        年代:1969
当前卷期:Volume 6  issue 2     [ 查看所有卷期 ]

年代:1969
 
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1. An Absolute Micromanometer Using Diamagnetic Levitation
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  279-288

R. Evrard,   G.-A. Boutry,  

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2. Destructive Breakdown in Thin Films of SiO,MgF2,CaF2,CeF3,CeO2and Teflon
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  289-303

Paul P. Budenstein,   Paul J. Hayes,   J. Lynn Smith,   Wallace B. Smith,  

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3. Inert Gas Ion Pumping Using Differential Sputter Yield Cathodes
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  304-307

T. Tom,   B. D. James,  

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4. Sputtered Silicon–Chromium Resistive Films
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  308-315

Robert K. Waits,  

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5. Hydrogen Pumping Speed of Sputter-Ion Pumps
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  316-321

J. H. Singleton,  

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6. Buried Collector Gauge for Measurements in the10−11Torr Pressure Range
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  322-325

Leonard T. Melfi,,  

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7. Theory of Pulsed Molecular-Flow Networks
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  326-332

B. R. F. Kendall,   R. E. Pulfrey,  

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8. Dielectric Properties of Reactively Evaporated Silicon Monoxide
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  333-337

Thomas A. Anastasio,  

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9. Application of the Triple Grid LEED System to Auger Spectrum Analyses
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  338-340

J. Morrison,   J. J. Lander,  

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10. Sorption of Oxygen at Very Low Pressures by Molybdenum Films
  Journal of Vacuum Science and Technology,   Volume  6,   Issue  2,   1969,   Page  340-342

N. Endow,   R. A. Pasternak,  

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