Electronics and Communications in Japan (Part II: Electronics)


ISSN: 8756-663X        年代:1996
当前卷期:Volume 79  issue 12     [ 查看所有卷期 ]

年代:1996
 
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     Volume 79  issue 12
1. Experiments on transmitting and receiving an ultrasonic pulse train with stacked piezoceramic transducers
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  1-9

Kazuhiko Imano,   Hidekatsu Kawazu,   Hiroshi Inoue,  

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2. Propagation characteristics of microstrip line with semiconductor substrate under laser spot illumination
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  10-16

Yasushi Horii,   Makoto Tsutsumi,  

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3. Design of switched‐capacitor oscillators composed of three phase‐shifters
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  17-23

Tomoyuki Miyazaki,   Teruaki Nomiyama,   Yuuji Horie,   Hiroshi Yoshida,  

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4. A voltage‐controlled resistor for a linear voltage‐controlled oscillator
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  24-31

Masahiro Teramura,   Tomoyuki Miyazaki,   Yuuji Hone,   Taisuke Takeishi,  

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5. Numerical analysis of nonlinear optical fiber couplers with a gaussian mode field distribution
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  32-39

Masaaki Imai,   Toshiharu Adachi,   Ken Takamatsu,   Yoh Imai,  

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6. A novel isolation technology utilizing Si selective epitaxial growth
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  40-46

Atsushi Hori,   Takehiro Hirai,  

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7. The BETA‐MOSFET: A novel high‐performance transistor
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  47-53

Kanji Yoh,   Ryouji Koizumi,   Naotaka Hashimoto,   Shuji Ikeda,  

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8. Impact of high‐temperature rapid thermal annealing in deep‐submicrometer CMOSFET design
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  54-63

Akihiro Shimizu,   Nagatoshi Ohki,   Hiroshi Ishida,   Toshiaki Yamanaka,   Ken‐Ichi Kikushima,   Kousuke Okuyama,   Katsuhiko Kubota,   Atsuyoshi Koike,  

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9. Single axial mode operation of resonantly pumped Yb:YAG microchip lasers
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  64-70

Takunori Taira,   William M. Tulloch,   Robert L. Byer,   Takao Kobayashi,  

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10. A solid‐phase epitaxy with clean surface formation using SiH4and Evaluation of SOI Layer
  Electronics and Communications in Japan (Part II: Electronics),   Volume  79,   Issue  12,   1996,   Page  71-78

Masahito Kodama,   Hirofumi Funabashi,   Yasuichi Mitsushima,   Yasunori Taga,  

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