1. |
The Source Width and Its Influence on Interference Phenomena in a Fresnel Electron Bi-prism |
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Optica Acta: International Journal of Optics,
Volume 11,
Issue 3,
1964,
Page 173-181
V. Drahoš,
A. Delong,
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摘要:
Expressions for the dependence of interference fringes contrast in a Fresnel electron bi-prism on source width or virtual sources distance are stated in the first part of the paper. For given working conditions the influence of the virtual sources distance on interference fringes contrast at different source widths is given. First disappearance of the contrast at a constant source width is experimentally verified.
ISSN:0030-3909
DOI:10.1080/713817876
出版商:Taylor & Francis Group
年代:1964
数据来源: Taylor
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2. |
On the Fraunhofer (Far Field) Diffraction Patterns of Opaque and Transparent Objects with Coherent Background |
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Optica Acta: International Journal of Optics,
Volume 11,
Issue 3,
1964,
Page 183-193
George B. Parrent,
Brian J. Thompson,
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摘要:
The diffracting objects considered are opaque and semi-transparent objects of known cross section which are situated in an otherwise transparent area and illuminated with a collimated quasi-monochromatic beam of light. The plane in which the resultant diffraction pattern is considered is at a sufficient distance from the object for the approximation of Fraunhofer (far field) diffraction to be made whilst still remaining in the near field of the surrounding transparent area. The resultant intensity distribution is investigated both theoretically and experimentally for objects which present both circular and rectangular cross sections to the beam.
ISSN:0030-3909
DOI:10.1080/713817880
出版商:Taylor & Francis Group
年代:1964
数据来源: Taylor
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3. |
Equi-reflectance Contours of Triple-layer Anti-reflection Coatings |
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Optica Acta: International Journal of Optics,
Volume 11,
Issue 3,
1964,
Page 195-205
T. Turbadar,
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摘要:
Calculations of reflectance as a function of wavelength have been carried out for many combinations of refractive indices, for the quarter-half-quarter wavelength construction of triple-layer anti-reflection coatings on glass at the angle of incidence 45°. The indices which provide the broadest region of very low reflectance were determined. Calculations of reflectance have been then carried out for the optimized triple-layer anti-reflection coatings for angles of incidence between 0° and 65°. Equi-reflectance contours were plotted to show the range of angles of incidence over which the reflectance is less than given values.
ISSN:0030-3909
DOI:10.1080/713817881
出版商:Taylor & Francis Group
年代:1964
数据来源: Taylor
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4. |
Complete Absorption of Plane Polarized Light by Thin Metallic Films |
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Optica Acta: International Journal of Optics,
Volume 11,
Issue 3,
1964,
Page 207-210
T. Turbadar,
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摘要:
The complete absorption of P-polarized light at oblique incidence on metal films is accompanied by sharply characteristic variations of reflection factor with angle of incidence; these are described by graphs as functions of the complex refractive index and proposals are made for using them to determine the complex refractive index.
ISSN:0030-3909
DOI:10.1080/713817875
出版商:Taylor & Francis Group
年代:1964
数据来源: Taylor
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5. |
On Möbius-band Interferometers |
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Optica Acta: International Journal of Optics,
Volume 11,
Issue 3,
1964,
Page 211-217
W.H. Steel,
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摘要:
A class of two-beam interferometers, insensitive to mirror tilt, is discussed. The mirrors at the ends of each arm of the interferometer are parallel and rigidly connected and these are moved to change the optical path. If the beams in the two arms have a relative twist of 180°, tilt of this pair of mirrors does not change the interference pattern. Polarization effects in such interferometers can be serious; their compensation is discussed.
ISSN:0030-3909
DOI:10.1080/713817874
出版商:Taylor & Francis Group
年代:1964
数据来源: Taylor
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6. |
The Calculation of the Reflectivity of an Absorbing Film on an Absorbing Substrate |
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Optica Acta: International Journal of Optics,
Volume 11,
Issue 3,
1964,
Page 219-221
G.H.C. Freeman,
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摘要:
The equations needed to write a computer programme for the calculation of the reflectivity of an absorbing surface film on an absorbing substrate are given. The two planes of polarization are treated separately. The equations for the phase change on reflection are also given.
ISSN:0030-3909
DOI:10.1080/713817879
出版商:Taylor & Francis Group
年代:1964
数据来源: Taylor
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7. |
Über Die Anzahl der an Einem Elementaren Schwärzungsprozeß Teilnehmenden Photonen in der Photographischen Schicht |
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Optica Acta: International Journal of Optics,
Volume 11,
Issue 3,
1964,
Page 223-235
H. Determann,
M. Ott,
H. Wolter,
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摘要:
In Anlehnung an chemische Elementarprozesse, bei denen man mittels des Massenwirkungsgesetzes auf die Anzahl der am Prozess teilnehmenden Moleküle aus der Potenz mit der die Konzentration bzw. der Druck auf die Geschwindigkeit des Prozesses Einfluß nimmt, schließt, wurde ein analoger Ansatz für den photographischen Elementarprozeß gemacht. Wenn k die Anzahl der die Schwärzung veranlassenden Photonen bezeichnet, so folgt die durch kleine Belichtungen B auf einer Photoplatte hervorgerufene Durchlässigkeitsabnahme einer Geraden mit der Steigungk.
ISSN:0030-3909
DOI:10.1080/713817878
出版商:Taylor & Francis Group
年代:1964
数据来源: Taylor
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8. |
Jenaer Jahrbuch, 1963 |
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Optica Acta: International Journal of Optics,
Volume 11,
Issue 3,
1964,
Page 236-236
Gg. Franke,
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ISSN:0030-3909
DOI:10.1080/713817877
出版商:Taylor & Francis Group
年代:1964
数据来源: Taylor
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