Journal of Applied Crystallography


ISSN: 1600-5767        年代:1990
当前卷期:Volume 23  issue 4     [ 查看所有卷期 ]

年代:1990
 
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1. A procedure for the generation of the symmetry of the multiple implication function from the crystal symmetry
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  225-227

F. Pavelčík,  

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2. Extreme asymmetric X‐ray Bragg reflection of semiconductor heterostructures near the edge of total external reflection
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  228-233

H.‐G. Brühl,   T. Baumbach,   V. Gottschalch,   U. Pietsch,   B. Lengeler,  

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3. Factors affecting data reproducibility on an area detector
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  234-240

J. P. Rose,   B.‐C. Wang,  

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4. Reduction of parasitic scattering in small‐angle X‐ray scattering by a three‐pinhole collimating system
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  241-245

G. D. Wignall,   J. S. Lin,   S. Spooner,  

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5. Simultaneous structure and size–strain refinement by the Rietveld method
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  246-252

L. Lutterotti,   P. Scardi,  

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6. Auto‐indexing of oscillation images
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  253-257

T. Higashi,  

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7. Time‐resolved neutron diffraction analyses of hydrothermal syntheses using a novel autoclave cell
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  258-262

E. Polak,   J. Munn,   P. Barnes,   S. E. Tarling,   C. Ritter,  

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8. A new crystal growth form of vaterite, CaCO3
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  263-265

A. M. Shaikh,  

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9. Anomalous small‐angle X‐ray scattering study of the early stages of decomposition in Cu–15wt%Ni–8wt%Sn
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  266-276

Ph. Goudeau,   A. Naudon,   J.‐M. Welter,  

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10. Study of ferroelastic domains in HTMA crystals at the ferroelectric–ferroelastic transition
  Journal of Applied Crystallography,   Volume  23,   Issue  4,   1990,   Page  277-281

M. Ribet,   S. Léon,   F. Lefaucheux,   M. C. Robert,  

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