Journal of Applied Crystallography


ISSN: 1600-5767        年代:1993
当前卷期:Volume 26  issue 5     [ 查看所有卷期 ]

年代:1993
 
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1. Application de la dispersion d'energie des rayons X à l'etude de la diffusion à petit angle
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  627-631

J. C. Malaurent,   H. Duval,  

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2. A mirror furnace for neutron diffraction up to 2300 K
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  632-635

G. Lorenz,   R. B. Neder,   J. Marxreiter,   F. Frey,   J. Schneider,  

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3. The structure of zeolite ZSM‐23 (MTT) refined from synchrotron X‐ray powder data
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  636-644

B. Marler,   C. Deroche,   H. Gies,   C. A. Fyfe,   H. Grondey,   G. T. Kokotailo,   Y. Feng,   S. Ernst,   J. Weitkamp,   D. E. Cox,  

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4. High‐resolution X‐ray diffraction of molecular‐beam‐epitaxy‐grown InAlAs/InGaAs/InAlAs three‐layer structures on (001)‐oriented InP substrates
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  645-649

H.‐G. Brühl,   A. Poecker,   H. Nickel,   R. Lösch,   W. Schlapp,  

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5. Applications of Fourier‐synthesis methods to the analysis of specular reflectivity
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  650-659

N. Singh,   M. Tirrell,   F. S. Bates,  

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6. Angle‐dispersive time‐of‐flight diffraction in a pulsed beam: an efficient technology to exploit the thermal‐neutron spectrum – design of a JULIOS diffractometer and experimental tests
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  660-669

W. Schäfer,   E. Jansen,   G. Will,  

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7. X‐ray determination of the Debye–Waller factors and order parameters of Ni3Al alloys
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  670-676

P. V. Mohan Rao,   K. S. Murthy,   S. V. Suryanarayana,   S. V. N. Naidu,  

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8. Dislocation contrast in white‐radiation synchrotron topography of silicon carbide
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  677-682

G. R. Fisher,   P. Barnes,   J. F. Kelly,  

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9. Recursive calculation of closed‐form scattering factors for atomic orbitals
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  683-686

M. Deutsch,  

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10. Resolution correction for surface X‐ray diffraction at high beam exit angles
  Journal of Applied Crystallography,   Volume  26,   Issue  5,   1993,   Page  687-696

C. Schamper,   H. L. Meyerheim,   W. Moritz,  

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