Journal of Applied Crystallography


ISSN: 1600-5767        年代:1990
当前卷期:Volume 23  issue 5     [ 查看所有卷期 ]

年代:1990
 
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1. A high‐resolution Weissenberg camera for X‐ray synchrotron radiation
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  351-354

D. Hohlwein,   J. D. Axe,  

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2. Bragg and diffuse components of X‐ray reflection measured using acoustic excitation of an Si crystal with oxide precipitates
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  355-358

I. R. Entin,   V. I. Khrupa,   L. I. Datsenko,  

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3. A fitting method for the determination of crystallinity by means of X‐ray diffraction
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  359-365

S. Polizzi,   G. Fagherazzi,   A. Benedetti,   M. Battagliarin,   T. Asano,  

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4. The internal structure of layered colloidal particles determined with SANS
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  366-373

M. H. G. Duits,   R. P. May,   C. G. De Kruif,  

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5. The rotation rate field and geometry of orientation space
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  374-377

A. Morawiec,  

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6. Improvements to the Chebyshev expansion of attenuation correction factors for cylindrical samples
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  378-386

D. F. R. Mildner,   J. M. Carpenter,  

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7. Mounting of crystals for macromolecular crystallography in a free‐standing thin film
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  387-391

T.‐Y. Teng,  

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8. The effect of diffraction by the diamonds of a diamond‐anvil cell on single‐crystal sample intensities
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  392-396

J. S. Loveday,   M. I. McMahon,   R. J. Nelmes,  

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9. High‐pressure single‐crystal study on AlPO4with synchrotron radiation
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  397-400

H. Sowa,   K. Reithmayer,   J. Macavei,   W. Rieck,   H. Schulz,   V. Kupčik,  

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10. Small‐angle X‐ray scattering at high energies
  Journal of Applied Crystallography,   Volume  23,   Issue  5,   1990,   Page  401-405

D. P. Siddons,   C. Riekel,   J. B. Hastings,  

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