Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films


ISSN: 0734-2101        年代:1991
当前卷期:Volume 9  issue 3     [ 查看所有卷期 ]

年代:1991
 
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291. Structure of the Si(111) (3)1/2×(3)1/2–Sb interface by surface x‐ray absorption fine structure and photoemission
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  1956-1961

J. C. Woicik,   T. Kendelewicz,   K. E. Miyano,   E. Spicer,  

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292. Alkali metal chains on the GaAs(110) surface
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  1962-1963

Inder P. Batra,   C. Y. Fong,  

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293. Sm/GaAs(110) interface formation: Surface instabilities and kinetic constraints
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  1964-1971

T. Komeda,   Steven G. Anderson,   J. M. Seo,   M. C. Schabel,   J. H. Weaver,  

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294. Empty electronic states of epitaxial Bi overlayers on InP(110): Effects of surface relaxation
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  1972-1976

M. B. Jost,   Yongjun Hu,   D. M. Poirier,   J. H. Weaver,  

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295. Comparison of hot cathode and cold cathode ionization gauges
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  1977-1985

R. N. Peacock,   N. T. Peacock,   D. S. Hauschulz,  

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296. Reduction of space charge effect on the sensitivity of a triode gauge
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  1986-1990

M. Hirata,   M. Ono,  

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297. Techniques for measuring mass spectrometer performance parameters
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  1991-1995

James A. Basford,  

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298. Comparative tests of quadrupole, magnetic, and time‐of‐flight residual gas analyzers
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  1996-2000

P. J. J. Abbott,   B. R. F. Kendall,   K. P. Trout,  

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299. Using microchannels to improve the performance of vacuum technology instrumentation
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  2001-2006

G. F. Vanderschmidt,  

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300. ‘‘Quick Release’’ concept in rotary vacuum pumps: A significant output increase in harsh semiconductor applications
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  9,   Issue  3,   1991,   Page  2007-2009

Silvio Dondoli,   Augusta Berna,  

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