Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films


ISSN: 0734-2101        年代:1993
当前卷期:Volume 11  issue 3     [ 查看所有卷期 ]

年代:1993
 
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1. Recommended Practice for the Calibration of Mass Spectrometers
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  22-40

James A. Basford,   Mark D. Boeckmann,   Robert E. Ellefson,   Albert R. Filippelli,   David H. Holkeboer,   Laslo Lieszkovsky,   Catherine M. Stupak,  

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2. Ultrahigh vacuum microscopy of the Si(111) boron √3×√3R30° surface
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  469-473

L. D. Marks,   R. Ai,   S. Savage,   J. P. Zhang,  

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3. X‐ray photoelectron and Auger electron spectroscopy study of ultraviolet/ozone oxidized, P2S5/(NH4)2S treated GaAs(100) surfaces
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  474-480

M. J. Chester,   Terrence Jach,   J. A. Dagata,  

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4. X‐ray photoelectron spectroscopy study of the polypropylene–magnesium interface afterin situplasma and ion treatment: Sticking, bonding, and film growth
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  481-489

S. Nowak,   M. Collaud,   G. Dietler,   P. Gröning,   L. Schlapbach,  

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5. In situinfrared measurements of film and gas properties during the plasma deposition of amorphous hydrogenated silicon
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  490-502

Philip W. Morrison,   John R. Haigis,  

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6. Redistribution of solid fuel in inertial confinement fusion target by plasma
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  509-513

C. M. Chen,   T. Norimatsu,   Y. Tsuda,   T. Yamanaka,   S. Nakai,  

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7. Measuring the depth of fluorine incorporation in high and low density polyethylene by Rutherford backscattering spectrometry
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  514-520

Eugene J. Karwacki,   Scott M. Bauman,  

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8. Analytical electron microscopy and Raman spectroscopy studies of carbon nitride thin films
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  521-524

Ming Y. Chen,   D. Li,   X. Lin,   V. P. Dravid,   Yip‐Wah Chung,   Ming‐Show Wong,   William D. Sproul,  

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9. Geometric and electronic structures of Na/GaAs
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  525-528

Chunli Bai,   Tomi Hashizume,   Dong‐Ryul Jeon,   Toshi Sakurai,  

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10. Observation of umklapp and surface bands in photoemission experiment on II–VI materials: A study of Cd0.6Hg0.4Te
  Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films,   Volume  11,   Issue  3,   1993,   Page  529-534

G. Lévêque,   M. Banouni,   C. Jouanin,   D. Bertho,   J. Bonnet,  

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