摘要:

The deposition probability and spatial distribution of atoms sputtered from a magnetron cathode have been semiquantitatively measured for a variety of chamber pressures for Cu and Al cathodes in Ne, Ar, and Kr gases. In this experiment, a large substrate plane was mounted parallel to a planar cathode. The cathode‐to‐sample distance was varied from 5 to 14.5 cm. Deposited films were measured on the sample plane, the area to the side of the cathode, and areas on the cathode itself. Deposition probabilities were calculated by comparison to the starting number of atoms. The deposition probability increased with decreasing pressure, throw distance, gas mass, and increasing cathode atom mass or discharge power. The redistribution back onto the cathode correlated inversely roughly with the deposition onto the sample plane. In the worst cases, sputtered atoms were more likely to redeposit onto the cathode surface than deposit on the sample plane. A clear trend was observed correlating gas scattering effects with local changes in the gas density due to thermalization effects in the background gas.

ISSN:0734-2101    

DOI:10.1116/1.575473

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

An ultrahigh vacuum apparatus is described for the simultaneous condensation of complete ternary alloy systems. Three singly controlled electron beam evaporation sources provide a constant evaporation rate of the different elements. A specially designed rotating mask guarantees a concentration gradient on the substrate according to a ternary phase diagram. The conversion of the actual concentration profile into a standard ternary phase diagram is done by simple computer calculations. They involve corrections for the beam characteristics of the evaporation sources and for the rotating mask. As an example, measurements for the Zr–Cu–Co system are given. The concentration range for the amorphous phase is compared with thermodynamic predictions using Miedema’s parameter.

ISSN:0734-2101    

DOI:10.1116/1.575474

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

The magnetic anisotropy constant of dc magnetron sputtered CoCr films are investigated as a function of the sputtering power and the target‐to‐substrate distance. The results can be interpreted in terms of the dependence of adatom diffusion on the supttering parameters. The orientation of the easy (hard) axis of the uniaxial magnetic anisotropy is found to be tilted away from the film normal and varies with the orientation of the substrate with respect to the target.

ISSN:0734-2101    

DOI:10.1116/1.575475

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

Variations in metal thickness and surface roughness of sputter‐deposited Cr/Cu/Cr metals on aluminum ceramics and glass slides were measured. The copper layer, which has a thickness of 75 kÅ, shows the most uniform surface, while the base chrome layer with an average thickness of 750 Å shows the least. Etch rates were determined as a function of surface roughness for chromium using a KMnO4/NaOH etchant and for copper using a FeCl3etchant. The results for both metals show that the rate increases 2–3 times when the surface roughness is increased.

ISSN:0734-2101    

DOI:10.1116/1.575476

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

Sputtered metal films grown in different discharge environments are subject to different degrees of energetic particle bombardment during film growth, resulting in different microstructure and subsequent thin‐film properties. The effect on film structure of energetic gas neutrals, backscattered from the sputtering target, together with the role of sputtered neutral metal atoms and those Penning ionized in traversing the plasma, are evaluated in different pressure regimes and under different biasing conditions. It will be shown that the film morphology, degree of texturing, and anisotropic lattice distortions change in a systematic way depending onEn, the energy delivered to the growing metal film surface per arriving metal atom.Enchanges predictably in different discharge pressure regimes as do the resultant film structures and properties.

ISSN:0734-2101    

DOI:10.1116/1.575477

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

Sputtered Au–TiNxthin films were deposited from two composite powder targets of Au and TiN with 4.4 and 8.5 mol % TiN, respectively. The composition of the sputtering atmosphere Ar–N2was varied with the N2partial pressure ranging from 0 to 2×10−1Pa. The influence of the reactive gas on the optical properties of the sputtered films has been investigated by means of differential reflectivity measurements and polarization modulation ellipsometry, in the photon energy range 1.5–5 eV. The observed properties are qualitatively interpreted on the basis of a composite microstructure: a dilute Au:Ti alloy acts as the host phase containing a small fraction of segregated TiNxgrains, of typical dimension lower than 2.5 nm. The concentration of the matrix alloy (Au:Ti) was deduced from the measured dielectric function on the basis of the virtual‐bound‐state model, which applies to transition‐metal impurities in noble‐metal hosts. The influence of the dispersed refractory phase has then been examined within a scheme of mean‐field theory.

ISSN:0734-2101    

DOI:10.1116/1.575478

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

Using an improved reactive sputter deposition technique, zirconium dioxide is deposited on cooled and uncooled substrates at low, medium, and high rates of 51.7, 95.4, and 152.4 nm/min, respectively. The films are deposited by sputtering a Zr target in an oxygen–argon plasma. The Zr target remains in the metallic state. The films are characterized by measuring the stoichiometry, refractive index, optical transmission, stress, and crystallinity as a function of deposition rate. Films deposited on (100)N‐type silicon substrates were annealed at temperatures ranging from 200 to 500 °C in steps of 50 °C. X‐ray diffraction patterns show that the ‘‘as‐deposited’’ films contain polycrystalline and amorphous phases of various amounts depending on the deposition rate and substrate temperature. Amorphous components crystallize into the cubic phase as the annealing temperature increases. At deposition rates of 95.4 and 152.4 nm/min, the refractive index and optical transmission (at 820 nm) of the unannealed, as‐deposited films are not affected by the quantity of material in the amorphous state and are also independent of substrate temperature.

ISSN:0734-2101    

DOI:10.1116/1.575479

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

Zinc cadmium telluride solid solution films with zinc/cadmium ratios as high as 40% have been deposited onto graphite substrates by the close‐spaced vapor transport method, using sources consisting of polycrystalline zinc cadmium telluride or mixtures of cadmium telluride and zinc telluride powders. High zinc concentrations in the films have been obtained by using small temperature differences for atmospheric pressure depositions, and by depositions under low pressures (0.3 Torr) for larger temperature differences. Hole densities of 5×1015cm−3were obtained with no intentional doping and with no dependence on the zinc concentration. Heterojunctions with cadmium sulfide were prepared to explore the junction properties of these films.

ISSN:0734-2101    

DOI:10.1116/1.575480

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

a‐C:H films with high hardness (>3500 kp/mm2) and high internal stress have been bombarded with 4‐MeV Ni+ions at several doses. Hardness, internal stress, and hydrogen content were measured as a function of Ni+dose. It was found that at doses between 3×1012and 3×1013ions/cm2the hardness decreases. At doses below 1013ions/cm2the internal stress increases above its original value. Hydrogen concentration and internal stress decrease in the ion range between 3×1013and 1015ions/cm2. For large doses the three properties reach a constant value.

ISSN:0734-2101    

DOI:10.1116/1.575481

出版商:American Vacuum Society    

年代:1988

数据来源: AIP

摘要:

We have shown that it is possible to form submicron‐sized particles of a highly ionic compound RbCl by thermally evaporating the reagent salt in 0.5–100 Torr of inert gas. By collecting the particles on a surface and then carefully removing them, bulk powder can be collected. The ambient gas species, pressure, system geometry, and evaporation temperature profile affect the size and geometry of the particles which form. Evidence indicates that if strong convection currents are present during evaporation, the number of individual primary particles in the powder is increased and the number of sintered strings of primary particles is reduced. The primary particle size depends on the geometry of the evaporation source used and is independent of the ambient pressure. In argon, the size of the particles collected is independent of the distance between the collection plates and the source. In helium, the size of the primary particles collected from a single run can vary from ∼10 to 1000 nm; the particle size collected is strongly dependent on the distance of the collection plates from the evaporation source.

ISSN:0734-2101    

DOI:10.1116/1.575482

出版商:American Vacuum Society    

年代:1988

数据来源: AIP