Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena


ISSN: 1071-1023        年代:1986
当前卷期:Volume 4  issue 2     [ 查看所有卷期 ]

年代:1986
 
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11. Summary Abstract: Si incorporation and segregation in Ga1−xAlxAs(100) films grown by molecular beam epitaxy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  519-520

A. Rockett,   J. Klem,   S. A. Barnett,   J. E. Greene,   H. Morkoç,  

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12. Summary Abstract: State‐of‐the‐art AlGaAs alloys by antimony doping
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  521-522

T. M. Kerr,   T. D. McLean,   D. I. Westwood,   J. D. Medland,   S. R. Blight,   C. E. C. Wood,  

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13. Summary Abstract: Optical properties of AlxGa1−xAs grown by molecular beam epitaxy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  523-524

D. C. Reynolds,   C. W. Litton,   K. K. Bajaj,   P. W. Yu,   Jasprit Singh,   P. J. Pearah,   W. T. Masselink,   T. Henderson,   J. Klem,   H. Morkoç,  

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14. Optical properties of GaAs/AlGaAs quantum wells grown by molecular beam epitaxy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  525-527

P. J. Pearah,   W. T. Masselink,   T. Henderson,   C. K. Peng,   H. Morkoç,   G. D. Sanders,   Yia‐Chung Chang,  

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15. Lattice‐mismatched heteroepitaxial interface of GaAsySb1−yon GaAs substrates
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  528-531

H. Cheng,   T. Koyanagi,   A. G. Milnes,  

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16. Summary Abstract: GaAs1−ySbygrowth by molecular beam epitaxy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  532-533

T. M. Kerr,   T. D. McLean,   D. I. Westwood,   J. D. Medland,   C. E. C. Wood,   I. J. Murgatroyd,  

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17. Summary Abstract: The influence of molecular beam epitaxy growth conditions on the Ga–Al–In–As ternary and quaternary systems
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  534-535

E. G. Scott,   D. A. Andrews,   G. J. Davies,  

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18. Summary Abstract: Growth and characterization of an InAs–GaAs superlattice alloy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  539-539

M. C. Tamargo,   R. E. Nahory,   P. Voisin,   M. Voos,   R. Hull,   A. Y. Cho,  

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19. Investigation of molecular beam epitaxial In0.53Ga0.47As regrown on liquid phase epitaxial In0.53Ga0.47As/InP
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  540-542

Y. Nashimoto,   S. Dhar,   W. P. Hong,   A. Chin,   P. Berger,   P. K. Bhattacharya,  

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20. Summary Abstract: Mn redistribution in doped GaInAs
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  4,   Issue  2,   1986,   Page  543-544

A. S. Brown,   G. W. Wicks,   L. F. Eastman,  

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