Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena


ISSN: 1071-1023        年代:1985
当前卷期:Volume 3  issue 5     [ 查看所有卷期 ]

年代:1985
 
     Volume 3  issue 1   
     Volume 3  issue 2   
     Volume 3  issue 3   
     Volume 3  issue 4   
     Volume 3  issue 5
     Volume 3  issue 6   
11. Plasma‐assisted etching mechanisms: The implications of reaction probability and halogen coverage
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1376-1383

Harold F. Winters,   J. W. Coburn,  

Preview   |   PDF (748KB)

12. Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2and low‐energy Ar+ions
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1384-1392

J. Dieleman,   F. H. M. Sanders,   A. W. Kolfschoten,   P. C. Zalm,   A. E. de Vries,   A. Haring,  

Preview   |   PDF (791KB)

13. Summary Abstract: Simultaneous exposure of SiO2and ThF4to XeF2and energetic electrons
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1393-1396

M. A. Loudiana,   J. T. Dickinson,  

Preview   |   PDF (269KB)

14. Raman characterization of catalysts
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1397-1403

A. Wokaun,   A. Baiker,   W. Fluhr,   M. Meier,   S. K. Miller,  

Preview   |   PDF (620KB)

15. Normal (unenhanced) Raman spectroscopy of molecules adsorbed on surfaces
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1404-1407

Alan Campion,  

Preview   |   PDF (297KB)

16. Photodesorption and adsorbate–surface interactions stimulated by laser radiation
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1408-1420

T. J. Chuang,  

Preview   |   PDF (1218KB)

17. Insituinfrared spectroelectrochemistry
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1421-1424

Carol Korzeniewski,   Stanley Pons,  

Preview   |   PDF (273KB)

18. Formation of silicon and water cluster ions in pulsed‐laser stimulated field desorption
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1425-1430

T. T. Tsong,  

Preview   |   PDF (522KB)

19. Selective laser‐stimulated desorption of molecules by internal vibration excitation
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1431-1435

C. Jedrzejek,  

Preview   |   PDF (433KB)

20. Technique for measuring surface diffusion by laser‐beam‐localized surface photochemistry
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  5,   1985,   Page  1436-1440

H. J. Zeiger,   J. Y. Tsao,   D. J. Ehrlich,  

Preview   |   PDF (355KB)

首页 上一页 下一页 尾页 第2页 共38条