Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena


ISSN: 1071-1023        年代:1998
当前卷期:Volume 16  issue 5     [ 查看所有卷期 ]

年代:1998
 
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51. Emission characteristics of a conical field emission gun
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2871-2875

Youiti Yamamoto,   Toshiaki Miyokawa,  

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52. Direct current circuit simulation model for a field emission triode
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2876-2880

Chih-Wen Lu,   Chung Len Lee,  

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53. Simulation study on performance of field emitter array
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2881-2886

Lei Wei,   Wang Baoping,   Yin Hanchun,  

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54. Low temperature plasma-promoted chemical vapor deposition of tantalum from tantalum pentabromide for copper metallization
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2887-2890

Xiaomeng Chen,   Harry L. Frisch,   Alain E. Kaloyeros,   Barry Arkles,  

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55. Photolithographic patterning of phosphor screens by electrophoretic deposition for field emission display application
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2891-2893

Sang Won Kang,   Jae Soo Yoo,   Jong Duk Lee,  

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56. Positive sample bias effect in scanning tunneling microscope imaging of low coverage alkali metal atoms on Si(111)7×7 surface
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2894-2897

J. Eitle,   D. Gorelik,   S. Aloni,   T. Margalit,   D. Meyler,   G. Haase,  

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57. Combined method of focused ion beam milling and ion implantation techniques for the fabrication of high temperature superconductor Josephson junctions
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2898-2901

C.-H. Chen,   I. Jin,   S. P. Pai,   Z. W. Dong,   R. P. Sharma,   C. J. Lobb,   T. Venkatesan,   K. Edinger,   J. Orloff,   J. Melngailis,   Z. Zhang,   W. K. Chu,  

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58. Reflow of copper in an oxygen ambient
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2902-2905

Seung-Yun Lee,   Dong-Won Kim,   Sa-Kyun Rha,   Chong-Ook Park,   Hyung-Ho Park,  

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59. Erratum: “Hole transport investigation in unstrained and strained SiGe” [J. Vac. Sci. Technol. B16, 1667 (1998)]
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  16,   Issue  5,   1998,   Page  2906-2906

F. M. Bufler,   P. Graf,   B. Meinerzhagen,   G. Fischer,   H. Kibbel,  

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