Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena


ISSN: 1071-1023        年代:1994
当前卷期:Volume 12  issue 4     [ 查看所有卷期 ]

年代:1994
 
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61. Measurement of heterojunction band offsets using ballistic electron emission microscopy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2625-2628

J. J. O’Shea,   T. Sajoto,   S. Bhargava,   D. Leonard,   M. A. Chin,   V. Narayanamurti,  

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62. In situstudy of epitaxial CoSi2/Si(111) by ballistic‐electron‐emission microscopy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2629-2633

H. Sirringhaus,   E. Y. Lee,   H. von Känel,  

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63. Lateral variation in the Schottky barrier height of Au/PtSi/(100)Si diodes
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2634-2638

A. Alec Talin,   R. Stanley Williams,   Brent A. Morgan,   Ken M. Ring,   Karen L. Kavanagh,  

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64. ZnSe(100): The surface and the formation of Schottky barriers with Al and Au
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2639-2645

W. Chen,   A. Kahn,   P. Soukiassian,   P. S. Mangat,   J. Gaines,   C. Ponzoni,   D. Olego,  

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65. Probing the CaF2density of states at Au/CaF2/n‐Si(111) interfaces with photoelectron spectroscopy and ballistic‐electron emission microscopy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2646-2652

M. T. Cuberes,   A. Bauer,   H. J. Wen,   M. Prietsch,   G. Kaindl,  

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66. Modification of Al/GaAs(001) Schottky barriers by means of heterovalent interface layers
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2653-2659

M. Cantile,   L. Sorba,   P. Faraci,   S. Yildirim,   G. Biasiol,   G. Bratina,   A. Franciosi,   T. J. Miller,   M. I. Nathan,   L. Tapfer,  

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67. Novelinsituelectrochemical technology for formation of oxide‐ and defect‐free Schottky contact to GaAs and related low‐dimensional structures
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2660-2666

Tamotsu Hashizume,   Giorgio Schweeger,   Nan‐Jian Wu,   Hideki Hasegawa,  

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68. Dynamical transmission effects and impact ionization in hot‐electron transport across NiSi2/Si(111)7×7 interfaces
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2667-2674

A. Bauer,   R. Ludeke,  

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69. Relation between atomic structure and surface‐stress anisotropy: Calculations for the clean Si(001) surface
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2675-2677

J. Da̧browski,   E. Pehlke,   M. Scheffler,  

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70. First‐principles study of Zn‐ and Se‐stabilized ZnSe(100) surface reconstructions
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  12,   Issue  4,   1994,   Page  2678-2683

Alberto García,   John E. Northrup,  

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