Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena


ISSN: 1071-1023        年代:1985
当前卷期:Volume 3  issue 2     [ 查看所有卷期 ]

年代:1985
 
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81. Surface emitting laser diode with AlxGa1−xAs /GaAs multilayered heterostructure
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  784-787

Mutsuo Ogura,   Takafumi Yao,  

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82. Wide band antireflection coatings for semiconductors grown by MBE
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  788-790

W. S. Truscott,   S. Fleischer,   K. E. Singer,  

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83. Summary Abstract: Molecular beam epitaxy GaAs integrated impatt structure
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  791-792

A. Christou,   N. A. Papanicolaou,  

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84. Summary Abstract: Molecular beam epitaxial growth of GaAs/AlGaAs heterojunction material for bipolar integrated circuits
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  793-793

H. D. Shih,   S. E. Matteson,   W. V. McLevige,   H. T. Yuan,  

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85. A gate‐controlled planar‐doped barrier switch
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  794-796

J. M. Szubert,   K. E. Singer,  

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86. Summary Abstract: Capacitance–voltage characteristics in modulation doped heterojunction FETs
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  797-797

George B. Norris,   D. C. Look,   W. Kopp,   J. Klem,   H. Morkoç,  

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87. Summary Abstract: Electron concentration inN‐AlGaAs/GaAs heterojunction field‐effect transistors and its dependence on spacer layer thickness
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  798-799

K. Hirakawa,   H. Sakaki,   J. Yoshino,  

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88. Summary Abstract: Backgating in modulation doped (Al,Ga)As/GaAs FET’s
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  800-801

D. Arnold,   J. Klem,   T. Henderson,   F. Ponse,   H. Morkoç,  

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89. Summary Abstract: Elimination of low‐temperature drainI–Vcollapse of selectively doped (Al,Ga)As/GaAs heterostructure transistors by a modulation‐doped superlattice donor layer
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  3,   Issue  2,   1985,   Page  802-802

C. W. Tu,   J. Chevalliers,   R. H. Hendel,   R. Dingle,   P. F. Sciortino,   T. M. Brennan,  

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