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81. |
Surface emitting laser diode with AlxGa1−xAs /GaAs multilayered heterostructure |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 784-787
Mutsuo Ogura,
Takafumi Yao,
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摘要:
We realize the first distributed feedback surface emitting laser diode with Al0.3Ga0.7As/GaAs multilayered heterostructure both by optical pumping and current injection. Sharp stimulated emission is observed at the selected wavelength determined by the optical cavity. Lateralp–njunction is formed by a selective Zn diffusion. The threshold current is 120 mA at 150 K with the active layer thickness of 6 μm and width of 3 μm. The temperature coefficient of the lasing wavelength is equal to a conventioal DFB laser diode. Anomalous mixing is found in the course of Zn diffusion and succeeding thermal treatment.
ISSN:1071-1023
DOI:10.1116/1.583099
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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82. |
Wide band antireflection coatings for semiconductors grown by MBE |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 788-790
W. S. Truscott,
S. Fleischer,
K. E. Singer,
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摘要:
The performance of any optoelectronic system and of infrared windows made from semiconductors is reduced by the large coefficient of reflection at each semiconductor‐free space surface, which has a typical value of about 30%. This paper reports the successful growth of multilayer antireflection coatings on GaAs using alternating layers of AlAs and GaAs. Bandwidths of 14% for a reflectivity of less than 13%, and 6% for a reflectivity of less than 7% were achieved, together with a minimum reflectivity of 1.3%. Model calculations suggest that these two structures can have reflectivities less than 10%, and 1% for these bandwidths under ideal conditions; the reasons for these discrepancies are explained. The results show that molecular beam epitaxy (MBE) has the potential for reproducible growth of antireflection coatings giving signal gains of 1.5 dB per surface at a given design wavelength.
ISSN:1071-1023
DOI:10.1116/1.583100
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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83. |
Summary Abstract: Molecular beam epitaxy GaAs integrated impatt structure |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 791-792
A. Christou,
N. A. Papanicolaou,
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ISSN:1071-1023
DOI:10.1116/1.583101
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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84. |
Summary Abstract: Molecular beam epitaxial growth of GaAs/AlGaAs heterojunction material for bipolar integrated circuits |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 793-793
H. D. Shih,
S. E. Matteson,
W. V. McLevige,
H. T. Yuan,
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ISSN:1071-1023
DOI:10.1116/1.583102
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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85. |
A gate‐controlled planar‐doped barrier switch |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 794-796
J. M. Szubert,
K. E. Singer,
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摘要:
A three‐terminal GaAs switch is demonstrated which utilizes the previously reported regenerative switching mechanism shown in a combined planar‐doped barrier (PDB) andp‐njunction. This latter, two‐terminal switch relies on a mechanism by which holes injected into the PDB reduce the net charge in thepplane, and thus leads to a lowering of the barrier for electrons. The resultant increase in thermionic emission of electrons over the barrier in turn leads to more hole injection from thep‐njunction. As bias is increased, a point is reached where the internal gain exceeds unity, the PDB collapses, and the device switches to its ‘‘on’’ state. The addition of a third terminal to thenregion of thep‐njunction allows hole injection within the PDB region to be controlled independently of the total bias across the device. This, in turn, enables the switching threshold voltage to be varied over the full operating range of the device. The device is also demonstrated to function as a reversible, gate‐controlled switch. In many respects the characteristics of the switch resemble those of the metal‐insulation silicon switch (MIS), but in this case the device is made entirely within the bulk of the semiconductor by MBE and does not rely on a tunneling oxide. The small dimensions in the direction of carrier transport should lead to fast switching speeds, and preliminary measurements have shown a switching‐on transition time of 2 ns, and off times of around 10 ns. These times correspond closely to the measured capacitance and resistance of the device and should be capable of substantial improvement in a more optimized structure. The device has possible applications as a high‐speed logic element.
ISSN:1071-1023
DOI:10.1116/1.583103
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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86. |
Summary Abstract: Capacitance–voltage characteristics in modulation doped heterojunction FETs |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 797-797
George B. Norris,
D. C. Look,
W. Kopp,
J. Klem,
H. Morkoç,
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ISSN:1071-1023
DOI:10.1116/1.583104
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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87. |
Summary Abstract: Electron concentration inN‐AlGaAs/GaAs heterojunction field‐effect transistors and its dependence on spacer layer thickness |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 798-799
K. Hirakawa,
H. Sakaki,
J. Yoshino,
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ISSN:1071-1023
DOI:10.1116/1.583105
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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88. |
Summary Abstract: Backgating in modulation doped (Al,Ga)As/GaAs FET’s |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 800-801
D. Arnold,
J. Klem,
T. Henderson,
F. Ponse,
H. Morkoç,
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ISSN:1071-1023
DOI:10.1116/1.583106
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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89. |
Summary Abstract: Elimination of low‐temperature drainI–Vcollapse of selectively doped (Al,Ga)As/GaAs heterostructure transistors by a modulation‐doped superlattice donor layer |
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Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Volume 3,
Issue 2,
1985,
Page 802-802
C. W. Tu,
J. Chevalliers,
R. H. Hendel,
R. Dingle,
P. F. Sciortino,
T. M. Brennan,
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ISSN:1071-1023
DOI:10.1116/1.583107
出版商:American Vacuum Society
年代:1985
数据来源: AIP
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