Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena


ISSN: 1071-1023        年代:1997
当前卷期:Volume 15  issue 3     [ 查看所有卷期 ]

年代:1997
 
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1. Fabrication of nanometer-size Si wires using a bevelSiO2wall as an electron cyclotron resonance plasma etching mask
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  543-547

Kenichi Ishii,   Eiichi Suzuki,   Toshihiro Sekigawa,  

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2. Time evolution of nanocontact structure between macroscopic metallic wires leading to nanowire formation
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  548-553

A. Correia,   M. I. Marqués,   N. Garcı́a,  

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3. Growth of silicon nanowires via gold/silane vapor–liquid–solid reaction
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  554-557

J. Westwater,   D. P. Gosain,   S. Tomiya,   S. Usui,   H. Ruda,  

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4. Cluster size measurement using microtrench in a thermal plasma flash evaporation process
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  558-565

Yuzuru Takamura,   Kei Hayasaki,   Kazuo Terashima,   Toyonobu Yoshida,  

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5. Subnanometer stability of nanostage supports
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  566-573

H. van der Wulp,   P. V. Pistecky,   W. Chr. Heerens,  

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6. 1 μm range comparative length measurement using a regular crystalline lattice and a dual tunneling unit scanning tunneling microscope
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  574-578

Masato Aketagawa,   Koji Takada,   Seiki Suzuki,   Shigetoshi Sasaki,   Hideaki Takahashi,  

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7. Integrated Fabry–Pérot distance control for atomic force microscopy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  579-585

A. Ruf,   M. Abraham,   J. Diebel,   W. Ehrfeld,   P. Güthner,   M. Lacher,   K. Mayr,   J. Reinhardt,  

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8. Deposition and atomic force microscopy of individual phthalocyanine polymers between nanofabricated electrodes
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  586-589

S. J. Tans,   L. J. Geerligs,   C. Dekker,   J. Wu,   G. Wegner,  

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9. Micromechanical thermal sensors: Comparison of experimental results and simulations
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  590-596

A. M. Moulin,   R. J. Stephenson,   M. E. Welland,  

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10. Intensification of optical electric fields caused by the interaction with a metal tip in photofield emission and laser-assisted scanning tunneling microscopy
  Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,   Volume  15,   Issue  3,   1997,   Page  597-601

Mark J. Hagmann,  

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