Journal of Materials Chemistry


ISSN: 0959-9428        年代:1994
当前卷期:Volume 4  issue 10     [ 查看所有卷期 ]

年代:1994
 
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1. Front cover
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  037-038

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2. Back cover
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  039-040

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3. Contents pages
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  087-088

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4. Back matter
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  089-098

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5. Novel aromatic poly(ether ketone)s. Part 1.—Synthesis and thermal properties of poly(ether keto imide)s
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  1511-1519

Anthony J. Lawson,  

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6. Novel aromatic poly(ether ketone)s. Part 2.—Synthesis and thermal properties of poly(ether keto amide)s
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  1521-1525

Anthony J. Lawson,  

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7. Novel aromatic poly(ether ketone)s. Part 3.—Synthesis of diamine precursors with 4–8 benzene rings linked by ether, ketone and sulfone groups
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  1527-1532

Anthony J. Lawson,  

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8. A new single-layer plasma-developable photoresist using the catalysed crosslinking of poly(4-hydroxystyrene)viaphotogenerated acid
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  1533-1538

James T. Fahey,  

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9. Laser photolytic studies on sensitizers for negative photoresists: 4,4′-diazido-3,3′-dimethoxybiphenyl in poly(methyl methacrylate) films
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  1539-1545

Akira Itaya,  

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10. Molecular design of amphotropic materials: double-headed diol-based mesogens incorporating rigid structural units
  Journal of Materials Chemistry,   Volume  4,   Issue  10,   1994,   Page  1547-1558

Frank Hentrich,  

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