Journal of Vacuum Science and Technology


ISSN: 0022-5355        年代:1973
当前卷期:Volume 10  issue 1     [ 查看所有卷期 ]

年代:1973
 
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1. Recent Advances in the Chemical Vapor Growth of Electronic Materials
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  1-10

T. L. Chu,   R. K. Smeltzer,  

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2. The Growth of a GaAs–GaAlAs Superlattice
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  11-16

L. L. Chang,   L. Esaki,   W. E. Howard,   R. Ludeke,  

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3. The Preparation of Thin Films of B-1 Structure Superconducting Ternary Compounds
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  17-19

J. R. Gavaler,   M. A. Janocko,   C. K. Jones,  

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4. Superconducting Properties and Structure of Reactively Sputtered Niobium Carbide Thin Films
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  20-21

Hermann J. Spitzer,  

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5. In SituSputter Cleaning of Thin Film Metal Substrates For UHV-TEM Corrosion Studies
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  22-25

Klaus Heinemann,   Helmut Poppa,  

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6. Carbon Monoxide Adsorption on Ni(110)
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  26-30

T. N. Taylor,   P. J. Estrup,  

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7. Orbital Energy Spectra of CO and Hg Adsorbed on Ni(100)
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  31-34

G. E. Becker,   H. D. Hagstrum,  

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8. The Adsorption and Decomposition of CO on Pt(111)
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  35-38

J. M. Martinez,   J. B. Hudson,  

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9. Time-of-Flight Analysis of Ions and Excited Neutrals Released by ESD of CO on (100) W
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  39-42

Ivor G. Newsham,   Donald R. Sandstrom,  

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10. Auger Line Shape Comparison of N and S in Two Different Chemical Environments
  Journal of Vacuum Science and Technology,   Volume  10,   Issue  1,   1973,   Page  43-46

E. N. Sickafus,   F. Steinrisser,  

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