Advanced Materials for Optics and Electronics


ISSN: 1057-9257        年代:1995
当前卷期:Volume 5  issue 1     [ 查看所有卷期 ]

年代:1995
 
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1. The X‐ray crystal and molecular structure of [Ba(TDFND)2.tetraglyme],the first molten barium precursor for MOCVD applications
  Advanced Materials for Optics and Electronics,   Volume  5,   Issue  1,   1995,   Page  1-10

Jason A. P. Nash,   John C. Barnes,   David J. Cole‐Hamilton,   Barbara C. Richards,   Stephen L. Cook,   Michael L. Hitchman,  

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2. Growth modes of solution‐grown CdS thin films
  Advanced Materials for Optics and Electronics,   Volume  5,   Issue  1,   1995,   Page  11-17

P. J. Sebastian,   Hailin Hu,   A. M. Fernández,  

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3. IR and UV laser‐assisted deposition from titanium tetrachloride: A comparative study
  Advanced Materials for Optics and Electronics,   Volume  5,   Issue  1,   1995,   Page  19-30

R. Alexandrescu,   R. Cireasa,   B. Dragnea,   I. Morjan,   I. Voicu,   A. Andrei,   F. Vasiliu,   C. Popescu,  

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4. Electrical conductivity of 1,4‐dihydroxyanthraquinone and the complex silver/dihydroxyanthraquinone
  Advanced Materials for Optics and Electronics,   Volume  5,   Issue  1,   1995,   Page  31-35

T. Ben Nasrallah,   J. C. Bernède,   M. Jamali,  

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5. Optically synaptic films using spiropyran J‐aggregates
  Advanced Materials for Optics and Electronics,   Volume  5,   Issue  1,   1995,   Page  37-43

A. Miyata,   T. Matsushima,   H. Ohki,   Y. Unuma,   Y. Higashigaki,  

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6. Preparation and purification of metal fluorides for crystals and glasses
  Advanced Materials for Optics and Electronics,   Volume  5,   Issue  1,   1995,   Page  45-51

B. E. Kinsman,   R. Hanney,  

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7. Editorial
  Advanced Materials for Optics and Electronics,   Volume  5,   Issue  1,   1995,   Page  -

David J. Cole‐Hamilton,  

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