Photolocking‐A new technique for fabricating optical waveguide circuits
作者:
E. A. Chandross,
C. A. Pryde,
W. J. Tomlinson,
H. P. Weber,
期刊:
Applied Physics Letters
(AIP Available online 1974)
卷期:
Volume 24,
issue 2
页码: 72-74
ISSN:0003-6951
年代: 1974
DOI:10.1063/1.1655099
出版商: AIP
数据来源: AIP
摘要:
Low‐loss dielectric optical waveguides have been made by a new process in which a photochemical reaction is used to lock or fix a dopant in a polymer film with a lower refractive index, and unreacted dopant is then removed by heating. Narrow guides ([inverted lazy s]4 &mgr;m wide, &Dgr;n[inverted lazy s] 1%) were formed by laser beam writing at &lgr;=364 nm or by contact printing at &lgr;=313 nm, and had losses of 0.20±0.05 dB/cm at &lgr;=633 nm.
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