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Photolocking‐A new technique for fabricating optical waveguide circuits

 

作者: E. A. Chandross,   C. A. Pryde,   W. J. Tomlinson,   H. P. Weber,  

 

期刊: Applied Physics Letters  (AIP Available online 1974)
卷期: Volume 24, issue 2  

页码: 72-74

 

ISSN:0003-6951

 

年代: 1974

 

DOI:10.1063/1.1655099

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Low‐loss dielectric optical waveguides have been made by a new process in which a photochemical reaction is used to lock or fix a dopant in a polymer film with a lower refractive index, and unreacted dopant is then removed by heating. Narrow guides ([inverted lazy s]4 &mgr;m wide, &Dgr;n[inverted lazy s] 1%) were formed by laser beam writing at &lgr;=364 nm or by contact printing at &lgr;=313 nm, and had losses of 0.20±0.05 dB/cm at &lgr;=633 nm.

 

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