Absorption saturation in germanium, silicon, and gallium arsenide at 10.6 &mgr;m
作者:
A.F. Gibson,
C.A. Rosito,
C.A. Raffo,
M.F. Kimmitt,
期刊:
Applied Physics Letters
(AIP Available online 1972)
卷期:
Volume 21,
issue 8
页码: 356-357
ISSN:0003-6951
年代: 1972
DOI:10.1063/1.1654410
出版商: AIP
数据来源: AIP
摘要:
The absorption ofp‐type Ge, Si, and GaAs at 10.6 &mgr;m decreases at high intensities. The saturation intensity of Ge, 10 MW cm−2, is sufficiently low for it to be used for passive mode locking of a TEA laser.
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