首页   按字顺浏览 期刊浏览 卷期浏览 p‐nJunction Photodiodes in PbTe Prepared by Sb+Ion Implantation
p‐nJunction Photodiodes in PbTe Prepared by Sb+Ion Implantation

 

作者: J. P. Donnelly,   T. C. Harman,   A. G. Foyt,   W. T. Lindley,  

 

期刊: Applied Physics Letters  (AIP Available online 1972)
卷期: Volume 20, issue 8  

页码: 279-281

 

ISSN:0003-6951

 

年代: 1972

 

DOI:10.1063/1.1654149

 

出版商: AIP

 

数据来源: AIP

 

摘要:

n‐pjunction photovoltaic detectors in PbTe have been fabricated using Sb+ion implantation to create then‐type layer. At 77 °K, 15‐mil square diodes have had zero‐bias resistances as high as 15 M&OHgr; for a resistance‐area product of 2.1×104&OHgr;cm2. Peak detectivities at 4.4 &mgr;m in reduced background as high as 1.6×1012cmHz1/2/W were observed. Diode quantum efficiencies were typically 40% at 4.4 &mgr;m.

 

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