p‐nJunction Photodiodes in PbTe Prepared by Sb+Ion Implantation
作者:
J. P. Donnelly,
T. C. Harman,
A. G. Foyt,
W. T. Lindley,
期刊:
Applied Physics Letters
(AIP Available online 1972)
卷期:
Volume 20,
issue 8
页码: 279-281
ISSN:0003-6951
年代: 1972
DOI:10.1063/1.1654149
出版商: AIP
数据来源: AIP
摘要:
n‐pjunction photovoltaic detectors in PbTe have been fabricated using Sb+ion implantation to create then‐type layer. At 77 °K, 15‐mil square diodes have had zero‐bias resistances as high as 15 M&OHgr; for a resistance‐area product of 2.1×104&OHgr;cm2. Peak detectivities at 4.4 &mgr;m in reduced background as high as 1.6×1012cmHz1/2/W were observed. Diode quantum efficiencies were typically 40% at 4.4 &mgr;m.
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