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Electromigration in conductor stripes under pulsed dc powering

 

作者: A.T. English,   K.L. Tai,   P.A. Turner,  

 

期刊: Applied Physics Letters  （AIP Available online 1972）
卷期: Volume 21, issue 8  

页码: 397-398

 

ISSN:0003-6951

 

年代: 1972

 

DOI:10.1063/1.1654428

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Thin Ti&sngbnd;Au films on sapphire were powered using pulsed dc. The incidence of electromigration damage is a complex function of pulse duration and repetition rate. For a given total ``exposure'' (fixed current density for a fixed total on‐time) the damage may be reduced or eliminated by using duty cycles less than 100%.

 

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