Significance of Electric Fields on the Growth of Thin Metal Films
作者:
L. E. Murr,
H. P. Singh,
期刊:
Applied Physics Letters
(AIP Available online 1972)
卷期:
Volume 20,
issue 12
页码: 512-514
ISSN:0003-6951
年代: 1972
DOI:10.1063/1.1654039
出版商: AIP
数据来源: AIP
摘要:
Thin films of Au, Ag, Pt, Pd, In, Sn, Bi, and Te were vacuum vapor deposited onto air‐cleaved NaCl (001) substrates in the absence of an electric field and in the presence of dc fields (in the plane of the substrate), ranging in intensity from 10 to 103V/cm. The vacuum environments were varied between 10−6and 10−9Torr, and evaporation rates ranged from 10 to 103Å/sec. Substrate temperatures were varied from 25 to 350°C for a distribution of mean film thicknesses ranging from 15 to 1200 Å. No significant effects of an electric field applied in the plane of the substrate were observed upon examination and comparison of representative film samples by transmission and scanning electron microscopy.
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