Solid‐phase transport and epitaxial growth of Ge and Si
作者:
C. Canali,
J. W. Mayer,
G. Ottaviani,
D. Sigurd,
W. van der Weg,
期刊:
Applied Physics Letters
(AIP Available online 1974)
卷期:
Volume 25,
issue 1
页码: 3-5
ISSN:0003-6951
年代: 1974
DOI:10.1063/1.1655265
出版商: AIP
数据来源: AIP
摘要:
Epitaxial growth of a semiconductor film from solid solution by dissolution and transport of an evaporated semiconductor layer through a metal film has been demonstrated. A Ge growth layer of 4800 Å has been obtained by heating the system bulk‐Ge/Al/evaporated‐Ge at 300 °C. Electrical measurements indicate that the layers are heavily dopedptype. A silicon growth of 2000 Å has been obtained by heating the system bulk‐Si/Pd/evaporated‐Si at 600 °C. Channeling measurements show that the Ge and Si layers are well ordered and epitaxial with the underlying substrate.
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