Surface-Thin Film Analysis by Ultrasoft X-Ray Fluorescence Spectroscopy
作者:
George Andermann,
Mark Lawson,
期刊:
Spectroscopy Letters
(Taylor Available online 1984)
卷期:
Volume 17,
issue 1
页码: 55-62
ISSN:0038-7010
年代: 1984
DOI:10.1080/00387018408068044
出版商: Taylor & Francis Group
关键词: Surface analysis;ultrasoft x-ray emission spectroscopy
数据来源: Taylor
摘要:
The use of x-ray fluorescence spectroscopy (XFS) using hard x-rays (λ <2 A), or soft (S) x-rays (2 A<λ<10 A) for elemental analysis of thin films and coatings, where the film thickness (t) is about 103A or greater, is textbook information.(1)A cursory examination of the literature reveals no information of thin film characterization (elemental or molecular) in the ultrasoft (US) region (λ>10 A). This finding is particularly surprising since, as discussed below, one could expect USXFS to be able to characterize surface-thin films with t values below 103A.
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