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Short‐pulse excitation of a xenon molecular dissociation laser at 172.9 nm by relativistic electrons

 

作者: Stephen C. Wallace,   R. T. Hodgson,   R. W. Dreyfus,  

 

期刊: Applied Physics Letters  (AIP Available online 1973)
卷期: Volume 23, issue 12  

页码: 672-674

 

ISSN:0003-6951

 

年代: 1973

 

DOI:10.1063/1.1654786

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Laser action at 172.9 nm has been observed in xenon and krypton‐xenon mixtures following short‐pulse excitation (2.5 nsec) by a relativistic electron beam. Peak powers [inverted lazy s] 80 kW cm−2in a 5‐nsec pulse were obtained. The pumping sheme used in this work is noteworthy because its high efficiency has made it possible to utilize a simple compact electron accelerator (total electron beam energy 6 J) for excitation. The present short‐pulse data suggest that the rapid decrease in energy efficiency of this laser at high xenon pressures may be due to excited‐state quenching by ground‐state xenon atoms.

 

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