Short‐pulse excitation of a xenon molecular dissociation laser at 172.9 nm by relativistic electrons
作者:
Stephen C. Wallace,
R. T. Hodgson,
R. W. Dreyfus,
期刊:
Applied Physics Letters
(AIP Available online 1973)
卷期:
Volume 23,
issue 12
页码: 672-674
ISSN:0003-6951
年代: 1973
DOI:10.1063/1.1654786
出版商: AIP
数据来源: AIP
摘要:
Laser action at 172.9 nm has been observed in xenon and krypton‐xenon mixtures following short‐pulse excitation (2.5 nsec) by a relativistic electron beam. Peak powers [inverted lazy s] 80 kW cm−2in a 5‐nsec pulse were obtained. The pumping sheme used in this work is noteworthy because its high efficiency has made it possible to utilize a simple compact electron accelerator (total electron beam energy 6 J) for excitation. The present short‐pulse data suggest that the rapid decrease in energy efficiency of this laser at high xenon pressures may be due to excited‐state quenching by ground‐state xenon atoms.
点击下载:
PDF
(204KB)
返 回