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Metalorganic chemical vapor deposition of oriented ZnO films over large areas

 

作者: Frank T. J. Smith,  

 

期刊: Applied Physics Letters  （AIP Available online 1983）
卷期: Volume 43, issue 12  

页码: 1108-1110

 

ISSN:0003-6951

 

年代: 1983

 

DOI:10.1063/1.94243

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A metalorganic chemical vapor deposition process for preparingc‐axis‐oriented ZnO films in a simple system of the type commercially available for SiO2deposition is described. The resulting layers are highly uniform in thickness and adhere to a variety of substrates. Film properties and structure are described briefly.

 

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