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An electron attachment plasma instability

 

作者: D. H. Douglas‐Hamilton,   Siva A. Mani,  

 

期刊: Applied Physics Letters  (AIP Available online 1973)
卷期: Volume 23, issue 9  

页码: 508-510

 

ISSN:0003-6951

 

年代: 1973

 

DOI:10.1063/1.1654978

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A new type of plasma instability is described in an electron‐beam ionized discharge. This instability occurs in gas mixtures in which the dissociative attachment rate increases strongly with electric field. It has been observed experimentally in He:H2O 740:20 and in He:CO21:1 and 9:1 mixtures. The values of the ionization source functionSand of the electric fieldEat which the wave instability occurs are predicted using a Fourier analysis of the linearized kinetic rate equations. This yields the condition for instability asS< (1/&agr;)[E&dgr;&bgr;/&dgr;E) − &bgr;]2, where &agr; is the electron‐ion recombination coefficient and &bgr; is the electron neutral attachment rate.

 

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