Hydrogen and fluorine profiles in GdF3films measured by sputter‐induced optical emission
作者:
I. S. T. Tsong,
A. S. Bhalla,
期刊:
Applied Physics Letters
(AIP Available online 1978)
卷期:
Volume 32,
issue 6
页码: 381-383
ISSN:0003-6951
年代: 1978
DOI:10.1063/1.90061
出版商: AIP
数据来源: AIP
摘要:
The sputter‐induced optical emission technique has been used to study the classical problem of the exchange of fluorine and hydroxyl ions in a solid. The hydroxyl ions were measured in the form of hydrogen atoms and detected by the characteristic hydrogen emission line at 6563 A˚ while the fluorine atoms were detected at 6902 A˚. Measurement of the optical intensities as a function of sputtering time produced the H and F depth profiles in GdF3films.
点击下载:
PDF
(235KB)
返 回