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ELECTRON DENSITIES AND TEMPERATURES IN A CLOSE‐SPACED CESIUM PLASMA DIODE

 

作者: W. H. Reichelt,  

 

期刊: Applied Physics Letters  (AIP Available online 1969)
卷期: Volume 14, issue 12  

页码: 382-384

 

ISSN:0003-6951

 

年代: 1969

 

DOI:10.1063/1.1652697

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Spectrographic techniques have been used to determine electron temperatures and densities in the interelectrode plasma of a close‐spaced high‐current cesium plasma diode. These results were obtained from the relative intensity of the radiative recombination continuum and measured line‐widths, respectively, of cesium. The diode was operated at two short‐circuit current conditions (∼15 and 18 A/cm2) with an interelectrode spacing of 0.25 mm. Contrary to some theories, these results indicate that steep temperature gradients do exist in the plasma and that maximum electron temperatures are 2800°K.

 

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