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High Intensity, Low Energy Spread Ion Source for Chemical Accelerators

 

作者: Michael Menzinger,   Lars Wa˚hlin,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1969）
卷期: Volume 40, issue 1  

页码: 102-105

 

ISSN:0034-6748

 

年代: 1969

 

DOI:10.1063/1.1683697

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A simple plasma ion source which is capable of delivering beams of 1×10−6A at 200 eV and 0.1–0.2 eV energy spread is described. Gas efficiencies of the order of percents are obtained. This source was found to be very successful in experiments using low energy beams in the electron volt region.

 

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