Low Pressure Sputtering System of the Magnetron Type
作者:
Kiyotaka Wasa,
Shigeru Hayakawa,
期刊:
Review of Scientific Instruments
(AIP Available online 1969)
卷期:
Volume 40,
issue 5
页码: 693-697
ISSN:0034-6748
年代: 1969
DOI:10.1063/1.1684039
出版商: AIP
数据来源: AIP
摘要:
A new design of a low pressure sputtering system of magnetron type is described. The optimum sputtering conditions are discussed in relation to the system. It is shown that this system is able to produce uniform thin films with good reproducibility, and especially to produce a metal oxide film by reactive sputtering. Some typical configurations are presented for use in the laboratory and on a production scale.
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